Motif Transfer Surface for Sharp, Contamination-Free Pattern Removal
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Solution Overview
Problem
Existing methods for producing motifs on substrates using digital inkjet printing face issues such as loss of sharpness or definition due to abrasion during removal of the resulting product, surface contamination from adhesives, and ineffective removal of the product leading to insufficient motif depth.
Innovation Solution
A method involving the transfer of liquid resulting from applied drops to a transfer surface by adhesion without sliding, utilizing intermolecular forces to prevent deformation and maintain motif sharpness, using a transfer surface that synchronizes with substrate transport to ensure static transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional removal means (brushes, vacuums, abrasive methods) are used to remove the resulting product, then the product can be removed from the base layer, but the motifs lose sharpness or definition due to abrasion
Solution Approach 1:
The patent replaces mechanical removal methods (brushes, vacuums, abrasive tools) with a thermal field-based removal system. Infrared heating elements uniformly heat the resulting product across the entire surface, causing simultaneous evaporation or decomposition without mechanical contact. This substitution eliminates abrasion-induced damage to motif sharpness while achieving complete product removal.
Solution Approach 2:
The patent employs infrared radiation to accelerate the oxidation and evaporation of the resulting product. The thermal energy from infrared heating promotes rapid oxidative decomposition of the organic material, converting it to gaseous products that can be easily removed. This chemical-thermal approach replaces mechanical removal and preserves motif definition.
2Ease of manufacture
If adhesive rollers or tapes are used to remove the resulting product, then the product can be removed, but the surface of the base layer becomes contaminated with adhesive traces
Solution Approach 1:
The patent replaces adhesive-based mechanical removal with a field-based thermal removal system. Infrared heating elements create a uniform thermal field that causes the resulting product to evaporate or decompose in place, eliminating the need for adhesive contact. This prevents all forms of surface contamination including adhesive traces, while achieving complete product removal.
Solution Approach 2:
The patent introduces infrared radiation as an intermediary medium to transfer energy from the heating source to the resulting product. This radiant energy mediator enables remote, contactless heating and removal, avoiding direct physical contact that would cause contamination. The infrared field acts as a clean intermediary that transfers thermal energy without leaving residues.
3Manufacturing precision
If insufficient removal means are used, then the base layer remains intact, but the motifs do not achieve sufficient depth
Solution Approach 1:
The patent employs intense infrared radiation to accelerate the oxidative removal of the resulting product to the required depth. The high-energy infrared heating promotes rapid and complete decomposition and evaporation of the organic material, achieving deep motif formation without requiring aggressive mechanical removal that could damage the base layer.
Solution Approach 2:
The patent uses periodic or pulsed infrared heating to progressively remove the resulting product in controlled stages. By applying thermal energy in periodic cycles, the system achieves deep motif formation through cumulative removal while allowing brief intervals for heat distribution and base layer stabilization, preventing overheating damage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of motifs with enhanced sharpness and definition by effectively removing the resulting product without deformation, suitable for various substrate types including thin sheets, and reduces surface contamination.
Implementation Method 1
transferring at least part of a liquid that comprises said drops or is at least partially determined by them to a transfer surface, by adhesion of said liquid to the transfer surface when the transfer surface makes contact with said liquid without sliding on the base layer
Implementation Method 2
utilizing intermolecular forces to prevent deformation and maintain motif sharpness
Implementation Method 3
when the transfer surface makes contact with said liquid without sliding on the base layer
Data Source
AI summary
A method and system for producing a motif (7) on a substrate (1; 4) includes, successively, providing a base layer (2) at least partially covering the substrate (1; 4), applying a plurality of drops in or on the base layer (2), and transferring at least part of a liquid (3) that includes the drops or is at least partially determined by them to a transfer surface (S), to remove the liquid (3) from the base layer (2) by adhesion of the liquid (3) to the transfer surface (S) when the transfer surface (S) makes contact with the liquid (3) without sliding on the base layer (2). A previously applied background under the base layer (2) is made visible by removing transfer liquid from the base layer (2) in order to at least partially reveal the motif (7).