Motorized Cleaning Substrate for Lithography Clamping Surfaces

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Solution Overview

Problem

Contamination of clamping structures in lithography tools leads to production issues, such as overlay errors and nonfunctional devices, due to manual cleaning methods that interrupt productivity and risk tool damage.

Innovation Solution

A dedicated cleaning substrate with onboard motive power, such as a piezoelectric motor, and an abrasive coating with absorbed alcohol, allows for in-situ cleaning by lateral motion without disturbing the tool or vacuum, effectively removing contaminants from clamping surfaces.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual cleaning of clamping structures is performed, then contamination is removed, but productivity is reduced and tool damage risk increases

Engineering Contradiction:

Improveclamping surface cleanlinessVSAvoidtool downtime

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The cleaning substrate is equipped with its own motor (e.g., piezoelectric motor) and power source, enabling it to autonomously perform cleaning operations without requiring external intervention or tool downtime. The substrate can independently position itself, apply cleaning forces, and execute cleaning cycles while the lithography tool remains operational.

Inventive Principle:

Principle #25Self-service

Solution Approach 2:

The cleaning substrate prepares for cleaning operations by positioning itself in advance and activating its motor before actual cleaning is needed. The substrate can perform preliminary positioning and setup operations while the tool is still productive, ensuring cleaning is ready when contaminants are detected or at scheduled intervals.

Inventive Principle:

Principle #10Preliminary action

2Reliability

If manual cleaning is performed, then contaminants are removed, but tool integrity is compromised due to potential damage

Engineering Contradiction:

Improveclamping surface cleanlinessVSAvoidtool damage risk

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The cleaning substrate acts as an intermediary between the cleaning mechanism and the clamping structure. It provides a controlled interface that applies cleaning forces through its motor and mechanical design, preventing direct contact between external cleaning tools and the sensitive clamping surfaces, thereby eliminating the risk of tool damage during cleaning operations.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention replaces manual mechanical cleaning operations with an automated motor-driven system. The motor (e.g., piezoelectric) provides precise, controlled mechanical motion that eliminates the uncontrolled forces and human error associated with manual cleaning, reducing the risk of damaging the clamping structure while maintaining effective contaminant removal.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Reliability

If automated cleaning with lateral motion is implemented, then cleaning effectiveness is improved, but device complexity increases

Engineering Contradiction:

Improvecontaminant removal effectivenessVSAvoidcleaning substrate structure

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The cleaning substrate is designed to serve multiple functions: it acts as both a cleaning tool and a functional component within the lithography tool. The substrate can be cleaned, used for cleaning clamping surfaces, and then discarded or reused, eliminating the need for separate dedicated cleaning equipment and reducing overall system complexity despite its motorized capabilities.

Inventive Principle:

Principle #6Universality (Multi-functionality)

Solution Approach 2:

The motor and cleaning mechanisms are localized to only the specific areas of the substrate that require active cleaning functionality. The design concentrates complexity only where needed (motor mounting, cleaning surface) while keeping the rest of the substrate simple and compatible with existing tool handling systems, minimizing the impact on overall device complexity.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables automated, contamination-free cleaning of clamping surfaces within the lithography tool, reducing downtime and preventing tool damage, while maintaining tool integrity and productivity.

Implementation Method 1

A dedicated cleaning substrate with onboard motive power, such as a piezoelectric motor

Methodology Applied

Scientific EffectPiezoelectric effect: Piezoelectric Effect

Implementation Method 2

an abrasive coating with absorbed alcohol, allows for in-situ cleaning by lateral motion

Methodology Applied

Scientific EffectAbrasion: Abrasion

Implementation Method 3

an abrasive coating with absorbed alcohol

Methodology Applied

Scientific EffectAbsorption: Absorption (physical)

Data Source

PatentUS11480885B2Apparatus for and method cleaning a support inside a lithography apparatus

Publication Date: 2022.10.25 ASML HLDG NV

AI summary

An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.