Mounting Table Structure with Coolant Path for Film Formation

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Solution Overview

Problem

Conventional film forming apparatuses face challenges in efficiently recovering raw materials, particularly high-cost metals like ruthenium, due to unnecessary deposition of thin films on chamber components, leading to wasted materials and increased costs for dry cleaning processes.

Innovation Solution

A mounting table structure with a coolant path and temperature control, where the base and peripheral components are maintained above the solidification temperature of the raw material gas but below its decomposition temperature, preventing unnecessary film deposition and allowing for the recovery of unreacted raw materials by thermal decomposition and separation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the processing chamber components (base, mounting table, cover ring) are heated during film formation, then the film formation reaction proceeds efficiently, but unnecessary adhesion films are deposited on these components, causing material waste and requiring frequent dry cleaning

Engineering Contradiction:
Improvefilm formation efficiencyVSAvoidraw material waste
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The invention divides the processing chamber components into two temperature zones: the mounting table and target object are heated to promote film formation, while the base and cover ring are cooled to prevent adhesion film deposition. This spatial segmentation of temperature control allows efficient film formation on the target while minimizing raw material waste on surrounding components.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different temperature conditions are applied to different parts of the processing chamber: high temperature (heating) is applied locally to the mounting table and target object where film formation is needed, while low temperature (cooling) is applied to the base and cover ring where adhesion prevention is needed. This local differentiation of thermal conditions resolves the contradiction between film formation efficiency and material waste.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If dry cleaning is performed frequently to remove adhesion films from components, then the film formation quality is maintained, but the processing time and operational complexity increase

Engineering Contradiction:
Improvefilm formation qualityVSAvoidcleaning frequency
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The invention applies preliminary anti-action by cooling the base and cover ring during film formation to prevent adhesion films from forming in the first place. This preventive measure eliminates the need for subsequent dry cleaning operations, thereby reducing processing time and maintaining film formation quality without frequent interruptions.

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The cooling system for the base and cover ring provides self-service by automatically preventing adhesion film deposition during film formation. This eliminates the need for external dry cleaning interventions, allowing the system to maintain itself without additional operational steps and reducing overall processing time.

Inventive Principle:
Principle #25Self-service

3Loss of substance

If the base and cover ring are cooled below the solidification temperature of the raw material, then adhesion film deposition is prevented, but the raw material condenses and clogs the gas exhaust system

Engineering Contradiction:
Improveadhesion film preventionVSAvoidexhaust system clogging
Core Design Contradiction:
Loss of substanceVSObject-generated harmful factors

Solution Approach 1:

The invention optimizes the cooling temperature parameter of the base and cover ring to be above the solidification temperature of the raw material. This parameter adjustment prevents adhesion film deposition while avoiding raw material condensation in the exhaust system, thus resolving the contradiction between adhesion prevention and exhaust system functionality.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention implements dynamic temperature control where the cooling degree of the base and cover ring is precisely regulated to maintain temperatures that prevent adhesion without causing condensation. This dynamic adjustment of thermal parameters allows the system to adaptively prevent adhesion films while avoiding exhaust system clogging.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces the frequency and cost of dry cleaning, effectively recovers raw materials, and minimizes unnecessary consumption by ensuring films are deposited only on the target object, enhancing the yield and reducing the load on the gas exhaust system.

Implementation Method 1

a base (116) supporting the mounting table main body (114) and having a coolant path (28) where a coolant flows

Methodology Applied
Scientific EffectHeat removal by coolant flow: Convection

Implementation Method 2

a mounting table main body (114) having a heating element (26) embedded therein

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Implementation Method 3

a film forming process for forming a thin film on a surface of a target object by using a raw material gas

Methodology Applied
Scientific EffectThermal decomposition: Thermolysis

Data Source

PatentUS8992686B2Mounting table structure, film forming apparatus and raw material recovery method
Publication Date: 2015.03.31 TOKYO ELECTRON LTD
  • US8992686B2 patent drawing
  • US8992686B2 patent drawing
  • US8992686B2 patent drawing

AI summary

Provided is a mounting table structure for use in forming a thin film on a surface of a target object mounted on the mounting table structure by using a raw material gas including an organic metal compound in a processing chamber. The mounting table structure includes: a mounting table main body which mounts thereon the target object and has therein a heater; and a base which supports the mounting table main body while surrounding a side surface and a bottom surface of the mounting table main body, the base having therein a coolant path where a coolant flows therethrough and being maintained at a temperature higher than the solidification temperature or the liquefaction temperature of the raw material gas, but lower than the decomposition temperature of the raw material gas.