Movable Bottom Plate for Solid Precursor Delivery
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing vapor phase precursor delivery systems face challenges in delivering sufficient vapor phase precursors due to low vapor pressure of solid precursors, leading to reduced productivity in deposition apparatuses.
Innovation Solution
A precursor delivery vessel with a movable bottom plate supported on the solid precursor surface, allowing for uniform sublimation and maintaining constant gas flow, is integrated with a holder and inert gas source to enhance precursor delivery.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a solid precursor with low vapor pressure is used in a vapor phase delivery system, then the precursor can be stored in solid form, but the vapor phase delivery efficiency becomes insufficient and becomes a bottleneck for productivity
Solution Approach 1:
The patent utilizes sublimation (solid to vapor phase transition) to deliver the precursor. The solid precursor sublimates directly into vapor phase, which is then transported to the deposition chamber. This phase transition mechanism enables efficient vapor delivery while maintaining stable solid storage, resolving the contradiction between storage reliability and delivery efficiency.
2Quantity of substance
If the solid precursor level decreases during use, then the sublimated precursor quantity becomes less, but maintaining a fixed chamber position cannot adapt to the changing precursor level
Solution Approach 1:
The chamber is designed to be movable rather than fixed, allowing it to adapt its position as the precursor level changes. The chamber can be repositioned to maintain optimal contact with the solid precursor surface, ensuring consistent sublimation efficiency throughout the precursor consumption process.
3Productivity
If gas flow touches the solid precursor surface, then precursor can be transported, but the top surface becomes carved and gas flow touches less solid precursor, reducing sublimation quantity
Solution Approach 1:
The chamber is designed to move or adjust its position to follow the receding precursor surface. This dynamic adjustment ensures that the chamber maintains consistent contact with the solid precursor throughout the process, preventing surface carving effects and maintaining uniform sublimation across the precursor bed.
Solution Approach 2:
The system incorporates feedback mechanisms to monitor precursor level and chamber position, automatically adjusting the chamber position to maintain optimal contact with the precursor surface. This feedback control ensures consistent gas flow contact and uniform sublimation throughout the process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures consistent delivery of vapor phase precursors, maintaining productivity by adapting to the changing precursor level and promoting uniform sublimation.
Implementation Method 1
The precursor delivery may be dependent on the level of the top surface of the solid precursor in the vessel. Since the level of the solid precursor in the vessel during use of the system may go down the solid precursor sublimated in the system may become less.
Data Source
AI summary
A vapor phase precursor delivery system for delivering a vapor phase precursor for depositing a layer in a vapor phase deposition apparatus is disclosed. The precursor delivery vessel is constructed and arranged to store a solid precursor and to deliver a vapor phase precursor at a vessel outlet. The system being provided with a plate provided with holes to allow for gas transport between the chamber and the part of the vessel where the solid precursor is stored.