Movable Central Reflector Assembly for Wafer Temperature Uniformity
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Solution Overview
Problem
Current reflectors in semiconductor processing chambers lack adjustability and flexibility in directing energy towards the substrate, limiting the ability to fine-tune heat distribution and temperature profiles during deposition processes.
Innovation Solution
A movable radiation reflector assembly with a reflector disk and actuator that can be axially displaced to adjust radiant energy direction and generate cooling channels, allowing for flexible energy direction and temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a fixed reflector is used in the deposition chamber, then the structure is simple and stable, but the ability to adjust energy directing and temperature distribution is limited
Solution Approach 1:
The patent applies the dynamics principle by making the reflector movable rather than fixed. The reflector is coupled to a positioning mechanism that enables it to change position and orientation dynamically, allowing adjustment of energy directing to different locations on the substrate while maintaining structural stability through controlled movement capabilities
2Temperature
If the reflector is made movable to adjust energy distribution, then temperature profile control is improved, but the device complexity increases
Solution Approach 1:
The reflector is designed with movable capabilities through coupling with a positioning mechanism, enabling dynamic adjustment of its position and orientation. This allows the system to optimize temperature distribution across the substrate by directing radiant energy to different locations, achieving uniform temperature profiles while managing complexity through controlled mechanical movement
Solution Approach 2:
The reflector assembly is designed to perform multiple functions: it reflects radiant energy from heat sources, directs energy to different locations on the substrate, and contributes to temperature uniformity control. This multi-functionality is achieved through the integrated design combining reflective surfaces with positioning capabilities, allowing a single component to address multiple process requirements
3Adaptability or versatility
If current fixed reflectors are used, then the device is simple to manufacture, but the flexibility in adjusting process parameters is insufficient
Solution Approach 1:
The reflector is designed with movable capabilities through coupling with a positioning mechanism, enabling dynamic adjustment of its position and orientation. This allows the system to optimize temperature distribution across the substrate by directing radiant energy to different locations, achieving uniform temperature profiles while managing complexity through controlled mechanical movement
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances temperature profile uniformity and deposition uniformity across the substrate by adjusting radiant energy distribution and incorporating cooling mechanisms, improving process control and efficiency.
Implementation Method 1
a reflector disk that includes a center hole, a bottom reflective surface, and a top surface
Implementation Method 2
directing, using the source reflector, radiant energy from the heat source to a substrate disposed within a processing chamber
Implementation Method 3
an actuator coupled to the reflector disk. The actuator is operable to axially displace the reflector disk relative to the shell body
Implementation Method 4
a reflector disk disposed within and spaced from the interior cylindrical wall in a manner that permits fluid to flow therebetween
Data Source
AI summary
The present disclosure relates to a radiation reflector assembly for use with a semiconductor processing chamber and a substrate processing system having the radiation reflector assembly. The radiation reflector assembly includes a shell body that includes an interior cylindrical wall; and a reflector disk that includes a center hole, a bottom reflective surface, and a top surface. The reflector disk is disposed within and spaced from the interior cylindrical wall in a manner that permits fluid to flow therebetween. The radiation reflector assembly includes an actuator coupled to the reflector disk, and the actuator is operable to axially displace the reflector disk relative to the shell body. The radiation reflector assembly includes an elongated tube extending through the center hole of the reflector disk. A method of processing a substrate with the radiation reflector assembly is also described.