Movable Edge Ring Control for Plasma Etching Accuracy
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Solution Overview
Problem
The plasma treatment apparatus faces issues due to wear of the edge ring, which distorts the sheath electric field and affects the accuracy of the etching process by altering the ion acceleration directions.
Innovation Solution
A drive mechanism is integrated to adjust the position and orientation of the edge ring members, allowing them to be raised and moved in the Z and XY directions to maintain a flat sheath electric field by compensating for wear, ensuring consistent ion acceleration and improved etching accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the edge ring is used in the plasma treatment apparatus, then the sheath electric field can be maintained flat initially, but the edge ring wears over time due to plasma exposure, causing distortion of the sheath electric field and affecting etching accuracy
Solution Approach 1:
The edge ring is designed to be movable rather than fixed, allowing it to be adjusted in position and orientation. The drive mechanism enables the edge ring to dynamically adapt to wear by raising it in the Z direction and rotating it about the Z axis, maintaining the flat sheath electric field despite plasma exposure over time
Solution Approach 2:
The system changes the positional parameters of the edge ring (Z position and rotational angle) to compensate for wear. By adjusting these parameters through the drive mechanism, the edge ring maintains its functional relationship with the substrate and stage, preserving etching accuracy despite material loss from plasma exposure
2Manufacturing precision
If the edge ring position is fixed, then the structure is simple, but the sheath electric field becomes distorted as the edge ring wears, reducing etching accuracy
Solution Approach 1:
The edge ring is divided into multiple independent members that can be individually adjusted. This segmentation allows the drive mechanism to selectively position and orient each member, enabling precise maintenance of the sheath electric field flatness while managing the complexity through modular control
Solution Approach 2:
The drive mechanism serves multiple functions: it raises the edge ring members in the Z direction, rotates them about the Z axis, and positions them in the XY plane. This multi-functionality consolidates what would otherwise require separate mechanisms, managing overall system complexity while achieving the goal of maintaining etching accuracy
3Reliability
If the edge ring members are raised and rotated frequently to compensate for wear, then the sheath electric field flatness is maintained, but the drive mechanism operation time and complexity increase
Solution Approach 1:
The system incorporates feedback control where the positions and orientations of the edge ring members are monitored and adjusted by the drive mechanism to maintain the flat sheath electric field. This feedback loop ensures that adjustments are made only when necessary to compensate for wear, optimizing the balance between maintaining field consistency and minimizing operation time
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The drive mechanism effectively maintains the sheath electric field's flatness, enhancing the accuracy and reliability of the etching process by adjusting the edge ring's position in response to wear, thereby improving the overall performance of the plasma treatment apparatus.
Implementation Method 1
The plasma generation portion generates plasma in a space adjacent to the main surface in the treatment chamber
Implementation Method 2
the edge ring surrounds the main surface when viewed from a direction perpendicular to the main surface. The drive mechanism can drive the edge ring in a direction along the main surface. The plasma generation portion can generate plasma in a space adjacent to the main surface in the treatment chamber
Data Source
AI summary
A plasma treatment apparatus including a stage, an edge ring, a drive mechanism, and a plasma generation portion is provided. The stage is disposed in a treatment chamber. The stage includes a main surface. A substrate is placed on the main surface. The edge ring is disposed in the treatment chamber. The edge ring surrounds the main surface when viewed from a direction perpendicular to the main surface. The drive mechanism can drive the edge ring in a direction along the main surface. The plasma generation portion can generate plasma in a space adjacent to the main surface in the treatment chamber.