Movable Edge Ring Structure for Stable RF Etching Control
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Solution Overview
Problem
The existing edge ring systems in substrate processing apparatuses face challenges in maintaining consistent process characteristics due to variations in the sheath height above the edge ring and substrate, leading to oblique ion incidence and altered etching shapes, particularly when one edge ring is consumed and moved vertically relative to another.
Innovation Solution
The edge ring is designed with a first and second edge ring configuration, where the second edge ring is movable vertically along the side surface of the first edge ring, ensuring that their side surfaces face each other within the movement range, maintaining a consistent RF path and electrical connection, thereby stabilizing the etching process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If one edge ring is vertically moved up and down to compensate for consumption, then the height difference of the sheath is eliminated, but variation in process characteristics occurs due to disruption of RF path and electrical connection
Solution Approach 1:
The edge ring is divided into a fixed first edge ring and a movable second edge ring. This segmentation allows the movable second edge ring to be adjusted vertically to compensate for consumption, while the fixed first edge ring maintains stable electrical connection and RF path, thus resolving the contradiction between maintaining etching precision and ensuring process stability.
2Duration of action of stationary object
If the edge ring is consumed and not replaced, then operational duration is extended, but sheath height difference causes oblique ion incidence and changes processing characteristics
Solution Approach 1:
The edge ring system transitions from a static structure to a dynamic one where the second edge ring can be moved vertically. This dynamic adjustment capability allows the system to maintain proper sheath height alignment and etching shape verticality throughout the extended service life of the edge ring, resolving the contradiction between operational duration and manufacturing precision.
3Device complexity
If a single edge ring is used, then device complexity is reduced, but inability to maintain consistent RF path during movement limits adjustment capability
Solution Approach 1:
By dividing the edge ring into fixed and movable segments, the system achieves both manageable complexity and enhanced adaptability. The fixed first edge ring provides stable electrical connection while the movable second edge ring provides adjustment capability, resolving the contradiction between device complexity and adaptability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures linear control of the etch rate and processing characteristics across the substrate edge region, reducing complexity and improving accuracy by maintaining a consistent RF path and electrical connection between the edge rings, even during vertical movement.
Implementation Method 1
maintaining a consistent RF path and electrical connection between the edge rings
Data Source
AI summary
An edge ring includes a first edge ring, and a second edge ring that has a side surface adjacent to a side surface of the first edge ring and is movable in a vertical direction along the side surface of the first edge ring. Further, the side surface of the first edge ring and the side surface of the second edge ring at least partially face each other in a movement range of the second edge ring.