Movable Plasma Chamber Insert for Radial Uniformity Tuning
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in achieving uniformity control and radial tunability without requiring hardware changes that disrupt the vacuum, as they often rely on fixed grids that are difficult to adjust during processing.
Innovation Solution
A plasma processing apparatus with a movable insert in the plasma chamber that can be vertically positioned to control plasma uniformity and efficiency by adjusting the plasma diffusion path, allowing for radial tunability without breaking the vacuum.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If fixed grids are used to separate plasma chamber from processing chamber, then structural simplicity is maintained, but uniformity control and radial tunability become difficult without manipulating process parameters
Solution Approach 1:
The patent applies the dynamics principle by making the insert movable within the plasma chamber. The insert can be positioned at different vertical locations to actively control plasma uniformity and achieve radial tunability. This dynamic adjustment capability allows the system to adapt to different processing requirements without changing the fundamental hardware configuration or manipulating process parameters like gas pressure and flow.
2Adaptability or versatility
If process parameters such as gas pressure, flow, and RF power are manipulated to control uniformity, then uniformity can be tuned, but process complexity and time consumption increase
Solution Approach 1:
The patent applies preliminary action by pre-configuring the insert at different vertical positions within the plasma chamber. These positions are predetermined to provide optimal plasma uniformity for different processing conditions. Instead of manipulating process parameters during processing, the desired uniformity is achieved by simply moving the insert to the appropriate pre-determined position, significantly reducing setup time and process complexity.
3Adaptability or versatility
If hardware changes are made to improve radial tunability, then radial uniformity can be enhanced, but vacuum disruption occurs
Solution Approach 1:
The movable insert provides radial tunability through dynamic positioning within the existing vacuum-sealed plasma chamber. The insert moves along the vertical axis without breaking the vacuum seal, maintaining vacuum stability while achieving the desired radial uniformity adjustment. This eliminates the need to open the vacuum chamber for hardware changes.
4Device complexity
If plasma chamber and processing chamber are directly connected, then process simplicity is maintained, but substrate exposure to plasma causes contamination
Solution Approach 1:
The patent applies the intermediary principle by using a movable insert as a mediator between the plasma chamber and the processing chamber. The insert can be positioned to control the transport of plasma species while preventing direct exposure of the substrate to the plasma. This intermediary structure allows plasma species to be filtered and controlled, reducing substrate contamination while maintaining process effectiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables active control of plasma uniformity and efficiency during processing by varying the insert's vertical position, improving radial tunability and ash rate without disrupting the vacuum.
Implementation Method 1
an inductively coupled plasma source configured to generate a plasma in the plasma chamber
Implementation Method 2
filtering the one or more species to generate a filtered mixture
Data Source
AI summary
Plasma processing apparatus for processing a workpiece are provided. In one example embodiment, a plasma processing apparatus for processing a workpiece includes a processing chamber, a plasma chamber separated from the processing, and an inductively coupled plasma source configured to generate a plasma in the plasma chamber. The apparatus includes a pedestal disposed within the processing chamber configured to support a workpiece. The apparatus includes an insert disposed in the plasma chamber movable to one or more vertical positions within the plasma chamber. Methods for processing of workpieces are also provided.