Movable Shower Head Bypass Member for Plasma Control
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Solution Overview
Problem
In substrate processing apparatuses, the generation of plasma between a movable electrode and an end wall of a cylindrical chamber leads to potential differences and electric fields, causing plasma generation and deposition issues.
Innovation Solution
A substrate processing apparatus with a movable electrode and a flexible bypass member that electrically connects the electrode to the side wall or end wall of the chamber, preventing potential differences and electric field generation by bypassing high-frequency currents, ensuring non-contact movement and uniform plasma distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a movable electrode is used to control the processing space, then the plasma distribution is improved, but potential differences and electric fields are generated causing plasma generation and deposition issues
Solution Approach 1:
A flexible barrier (bellows) is introduced as an intermediary component between the movable shower head electrode and the chamber ceiling wall. This bellows electrically connects the electrode to the wall while maintaining flexibility for movement, thereby preventing potential differences and unwanted plasma generation in the gap between the electrode and wall.
Solution Approach 2:
The harmful electric field and potential difference are extracted or removed from the system by providing an electrical connection path through the flexible barrier. This eliminates the charge accumulation that would otherwise occur between the movable electrode and the chamber wall during electrode movement.
2Adaptability or versatility
If the shower head is configured to be movable, then the layout flexibility is improved, but the electrical connection to the chamber wall becomes complex
Solution Approach 1:
A flexible bellows is used to provide the electrical connection between the movable shower head and the chamber wall. The bellows can expand and contract to accommodate the vertical movement of the shower head while maintaining continuous electrical contact, thus simplifying the overall structure compared to rigid connection mechanisms.
Solution Approach 2:
The electrical connection structure is made dynamic through the use of a flexible bellows that can adapt its shape and length according to the position of the movable shower head. This dynamic structure maintains electrical connectivity throughout the range of motion without requiring complex sliding contacts or flexible cables.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses plasma generation between the movable electrode and the chamber wall, maintaining uniform plasma distribution and preventing deposition, while allowing smooth electrode movement and efficient plasma processing.
Implementation Method 1
a flexible barrier configured to connect the moving electrode to an end wall at one side of the cylindrical chamber
Implementation Method 2
a bypass member is installed to electrically contact the moving electrode to the side wall or the end wall at one side of the cylindrical chamber
Implementation Method 3
A high frequency power is applied to a processing space between the moving electrode and the opposing electrode, and a processing gas is introduced to the processing space
Data Source
AI summary
Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.