Movable Shutter System for Multi-Coat Substrate Processing
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Solution Overview
Problem
Current vacuum coating apparatuses are inefficient in utilizing substrate load capacity, as they can only coat substrates with a single type of coating in a batch, leading to increased processing and delivery times, and are complex and costly to operate when trying to apply different coatings with varying layer thicknesses or architectures.
Innovation Solution
A treatment and coating apparatus with a modular chamber and movable shutter system that allows multiple substrate groups to be coated in a single batch, with each group receiving different surface treatments by positioning shutter elements to control the flow of treatment agents, enabling adjustable layer thickness and architecture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single treatment chamber with multiple substrate carriers is used, then the apparatus can handle multiple substrates, but all substrates can only receive the same type of coating in one batch
Solution Approach 1:
The treatment chamber is divided into multiple independently controllable zones using movable shutter elements. Each zone can be selectively opened or closed to allow different coating materials to reach specific substrate carriers, enabling different coating types to be applied to different substrate groups within the same batch.
Solution Approach 2:
Movable shutter elements are introduced to dynamically control the flow paths between coating sources and substrate carriers. These shutters can be positioned at different locations and angles during the coating process, allowing flexible redirection of coating materials to different substrate groups, thus enabling multi-type coating in a single batch.
2Adaptability or versatility
If multiple batches are run to coat different substrate types with different coatings, then coating versatility is achieved, but processing time and costs increase
Solution Approach 1:
Multiple coating processes that would traditionally require separate batches are merged into a single batch operation. By using movable shutters to control material flow paths, the apparatus can simultaneously apply different coating materials to different substrate carriers within the same treatment cycle, eliminating the need for multiple sequential batches.
Solution Approach 2:
The coating process continues uninterrupted for all substrate carriers throughout the batch cycle. The movable shutter elements enable continuous coating deposition while dynamically redirecting materials, ensuring that all substrates receive their required coatings in a single continuous operation rather than requiring intermittent batch interruptions.
3Adaptability or versatility
If movable shutter elements are added to enable selective coating, then coating flexibility improves, but device complexity increases
Solution Approach 1:
Instead of implementing a complex global control system, the patent applies simple movable shutter elements at specific local positions where material flow paths diverge. Each shutter is positioned to control access to a specific substrate carrier or group, providing localized control that simplifies the overall system architecture while achieving the desired coating flexibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces processing time and costs by allowing multiple substrates with different coating requirements to be coated in a single batch, increasing operational efficiency and productivity while maintaining high substrate load capacity utilization.
Implementation Method 1
In a PVD process at least a part of the coating material which condenses on the substrate surface from the gas phase for forming the PVD film is generated from a solid material source
Implementation Method 2
at least a part of the coating material which condenses on the substrate surface from the gas phase for forming the PVD film
Data Source
Figure 1~2c
Figure 3~3e
Figure 4~5b
AI summary
The present invention relates to an apparatus for treating and/or coating substrate surfaces having a substrate shutter system which allows a better economical utilization of the apparatus as well as a more versatile buildup of multilayer coating structures. The apparatus according to the present invention is characterized by comprising at least one substrate holding system (3) that comprises at least one shutter system comprising at least one movable shutter element (1) to be arranged around of at least a portion of the holder system for shielding at least some of the substrates arranged in the holding system in such a manner that the surface of the shielded substrates cannot be treated during the execution of the one or more surface treatments or at least during a part of the execution of the one or more surface treatments because the movable shutter element interrupts at least partially or avoid completely the surface treatment of the shielded substrates.