Movable Substrate Holders for ALD Loading Access
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Solution Overview
Problem
Conventional atomic layer deposition (ALD) apparatuses face challenges in loading substrates due to limited access and space constraints, leading to inefficiencies in precursor delivery and film quality issues, as well as larger apparatus sizes that complicate transportation and precursor consumption.
Innovation Solution
The apparatus allows for movable substrate holders during the loading phase, increasing space for the loading device and optimizing substrate spacing during processing, using an actuator to adjust holder positions and a lifting mechanism to manage the substrate rack, ensuring efficient loading and compact apparatus design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the spacing between substrates is reduced to improve reaction space efficiency, then the reaction space utilization is improved, but the loading device access becomes limited and loading complexity increases
Solution Approach 1:
The substrate holder is designed with movable shelves that can dynamically adjust their positions. During the loading phase, shelves are positioned to provide wide access for the loading device. During the processing phase, shelves are positioned closely together to maximize reaction space efficiency. This dynamic repositioning resolves the contradiction between loading accessibility and reaction space utilization.
2Quantity of substance
If the substrate holder size is increased to accommodate heavier substrates, then the substrate loading capacity is improved, but the apparatus size increases leading to higher precursor consumption and larger footprint
Solution Approach 1:
The substrate holder is segmented into multiple independent shelves that can be individually positioned. This segmentation allows the system to accommodate substrates of varying weights and sizes without requiring a uniformly large holder structure. Each shelf can be optimized for its specific loading requirements, reducing the overall apparatus size and minimizing precursor consumption while maintaining high substrate loading capacity.
3Ease of operation
If the distance between shelves is increased to facilitate substrate loading, then the loading ease is improved, but the precursor consumption increases and flushing efficiency decreases
Solution Approach 1:
The shelves are equipped with actuators that enable dynamic adjustment of inter-shelf distances. During loading operations, shelves are temporarily positioned farther apart to facilitate easy substrate placement. During processing, shelves are positioned closely together to minimize precursor and flushing gas consumption and to optimize flushing efficiency. This time-dependent repositioning resolves the contradiction between loading ease and resource efficiency.
4Volume of stationary object
If the apparatus size is reduced to improve transportation and reduce precursor consumption, then the footprint and cost are reduced, but the loading device access becomes restricted
Solution Approach 1:
The compact apparatus incorporates movable shelves that create dynamic access pathways. When loading is required, shelves are repositioned to open up access corridors for the loading device, temporarily increasing accessibility without permanently enlarging the apparatus footprint. This dynamic spatial reconfiguration allows the system to maintain a compact size while providing adequate loading device access when needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables efficient loading of substrates with adequate space for the loading device, maintaining optimal substrate spacing for material deposition while keeping the apparatus compact, reducing precursor consumption and improving film quality.
Implementation Method 1
at least some of the substrate holders are arranged to be movable relative to each other
Implementation Method 2
processing substrates by subjecting at least part of the surface of the substrate to alternating surface reactions of two or more precursor materials
Data Source
AI summary
An apparatus for processing two or more substrates in a batch process by subjecting at least part of the surface of the substrates to alternating surface reactions of at least a first and a second precursor. The apparatus includes: multiple substrate holders for supporting the substrates, and a reaction chamber that includes a reaction space for depositing material on the surface of the substrates during a processing phase. The substrate holders are installed or arranged to be installed inside the reaction chamber for processing of the substrates inside the reaction chamber during the processing phase. During a loading phase in which the substrates are loaded to the substrate holders by a loading device, at least some of the substrate holders are arranged to be movable relative to each other.