Movable Substrate Support Unit for Uniform Cleaning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In semiconductor substrate processing, existing technologies face challenges in ensuring uniformity of processes, leading to malfunctions due to non-uniform cleaning and other processes, which result in impurity particles and watermarks on substrates.
Innovation Solution
A substrate support unit with movable first and second support parts that supply processing fluids in specific directions to ensure uniform coverage of the substrate, preventing defects by stabilizing the substrate at different positions during various processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single support part is used to support the substrate, then the device complexity is reduced, but the process uniformity deteriorates leading to watermarks and impurity particles
Solution Approach 1:
The substrate support unit is divided into multiple support parts (first support part and second support part) that can be independently positioned. The first support part supports a first portion of the substrate while the second support part supports a second portion, allowing processing fluid to uniformly cover the entire substrate surface without obstruction from a single centralized support structure.
2Manufacturing precision
If the substrate is stationary during processing, then the device complexity is reduced, but the process uniformity deteriorates causing non-uniform cleaning and watermarks
Solution Approach 1:
The substrate support unit incorporates movable support parts that can dynamically adjust their positions. The first support part is movable in a first direction and the second support part is movable in a second direction, enabling the system to adapt to different processing requirements and ensure uniform processing fluid distribution across the substrate during cleaning operations.
Data Source
AI summary
Provided are a substrate support unit and a substrate treating apparatus and method using the same. The substrate support unit includes a first support part and a second support part. The first support part is movable in a first direction. The first support part supports a first portion of a substrate in which a processing fluid is supplied in a direction corresponding to the first direction. The second support part is movable in a second direction. The second support part supports a second portion of the substrate. At least one of the first support part and the second support part supports the substrate while the processing fluid is supplied.