Movable Tank Rinsing and Drying Substrate Systems
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Solution Overview
Problem
In semiconductor device manufacturing, achieving uniform Marangoni drying of substrates is challenging, and particles from the rinsing bath fluid often re-attach to the substrate during the drying process, causing contamination.
Innovation Solution
A system with a movable tank that translates between loading and drying positions, equipped with multiple compartments for cleaning chemistry and a drying station that uses a rinsing fluid curtain and solvent gas flow to minimize particle re-attachment through Marangoni drying, ensuring effective rinsing and drying of substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If Marangoni drying is used to prevent streaking and residue, then substrate surface quality is improved, but particle re-attachment occurs during the drying process
Solution Approach 1:
The drying process is segmented into multiple zones: a rinsing zone with rinsing fluid delivery and a Marangoni drying zone with solvent vapor delivery. This segmentation allows the substrate to be rinsed first to remove particles, then dried without particle re-attachment, achieving both surface quality and particle prevention
Solution Approach 2:
The substrate is preliminarily rinsed with rinsing fluid before entering the Marangoni drying zone. This preliminary rinsing action removes particles from the substrate surface before drying begins, preventing particle re-attachment during the subsequent drying process while maintaining the surface quality benefits of Marangoni drying
2Manufacturing precision
If a rinsing bath is used to clean substrates, then substrate cleanliness is improved, but bath fluid evaporation causes streaking and residue
Solution Approach 1:
The system uses phase transition of solvent (from vapor to absorbed liquid) to create Marangoni flow. Solvent vapor is delivered to the rinsing fluid meniscus, absorbed into the liquid phase, and creates surface tension gradients that drive fluid flow from the substrate surface, preventing streaking and residue while maintaining substrate cleanliness
Solution Approach 2:
Solvent vapor acts as an intermediary substance between the rinsing bath and the substrate surface. It is delivered to the meniscus region, absorbed into the rinsing fluid, and mediates the drying process by creating Marangoni flow that removes bath fluid from the substrate without causing evaporation-related defects
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system reduces particle re-attachment and contamination by using a movable tank with multiple compartments and a drying station that employs a rinsing fluid curtain and solvent gas flow, achieving robust and uniform rinsing and drying of substrates, thereby preventing streaks, spotting, and residue.
Implementation Method 1
The solvent vapor is absorbed along the surface of the fluid, with the concentration of the absorbed vapor being higher at the tip of the meniscus.
Implementation Method 2
The higher concentration of absorbed vapor causes surface tension to be lower at the tip of the meniscus than in the bulk of the bath fluid, causing bath fluid to flow from the drying meniscus toward the bulk bath fluid. Such a flow is known as a 'Marangoni' flow
Data Source
AI summary
In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided.