Movable Wall Exhaust Port for Substrate Processing Uniformity

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Solution Overview

Problem

Existing batch type substrate processing apparatuses face challenges in achieving inter-plane uniformity due to fixed gas exhaust port shapes, which cannot be adjusted for varying process conditions and numbers of substrates.

Innovation Solution

A substrate processing apparatus with a movable wall and pressure detection system that adjusts the balance of gas exhaust by changing the shape of the gas exhaust ports, allowing for control of gas flow velocity and pressure regulation to ensure uniformity across substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If the gas exhaust port shape is fixed on an apparatus-by-apparatus basis, then the device structure is simple, but the inter-plane uniformity cannot be adjusted for different process conditions and substrate quantities

Engineering Contradiction:
Improveinter-plane uniformity adjustment capabilityVSAvoidexhaust port structure complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The exhaust port structure is made dynamic by introducing a movable wall that can change the shape and opening area of the exhaust port. The movable wall is positioned between the inner tube and outer tube and can be moved to adjust the exhaust port configuration according to different process conditions and substrate quantities, enabling inter-plane uniformity adjustment without requiring multiple fixed apparatuses

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The opening area and shape of the exhaust port are changed as adjustable parameters. By moving the movable wall, the opening area of the exhaust port is varied to control the gas flow velocity and exhaust balance, allowing optimization of inter-plane uniformity for different processing scenarios

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If the exhaust port opening width is gradually narrowed, then the gas flow velocity uniformity is improved, but the exhaust balance cannot be adjusted for varying process conditions

Engineering Contradiction:
Improveexhaust balance adjustabilityVSAvoidexhaust port configuration flexibility
Core Design Contradiction:
Adaptability or versatilityVSEase of operation

Solution Approach 1:

The exhaust port configuration is made dynamically adjustable through the movable wall mechanism. Instead of a fixed narrowed opening, the movable wall can be positioned at different locations to create varying degrees of narrowing or opening, allowing real-time adjustment of exhaust balance according to process requirements

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The exhaust port is segmented into adjustable sections by the movable wall. The movable wall divides the exhaust path into controllable segments, allowing independent adjustment of the opening area and shape to optimize gas flow distribution for different substrate configurations

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus achieves desired inter-plane uniformity by dynamically adjusting the exhaust balance and gas flow, accommodating different process conditions and substrate quantities, thereby improving processing consistency.

Implementation Method 1

a pressure detection part configured to detect a pressure inside the inner tube

Methodology Applied
Scientific EffectPressure detection:

Implementation Method 2

an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion

Methodology Applied
Scientific EffectGas flow:

Data Source

PatentUS11208721B2Substrate processing apparatus
Publication Date: 2021.12.28 TOKYO ELECTRON LTD
  • US11208721B2 patent drawing
  • US11208721B2 patent drawing
  • US11208721B2 patent drawing

AI summary

A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.