Moveable Edge Ring Structure for Etch Uniformity and Plasma Sealing
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Solution Overview
Problem
Substrate processing systems face challenges in achieving uniform etch rates and preventing plasma leakage due to fixed edge ring configurations, which can lead to erosion and misalignment issues.
Innovation Solution
The implementation of a moveable edge ring system, supported by a bottom ring and optionally a middle ring, allows for adjustable height and geometry, enabling control of etch uniformity and preventing plasma leakage through a labyrinthine interface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a fixed edge ring configuration is used, then the structure is simple and easy to manufacture, but etch uniformity deteriorates and plasma leakage increases
Solution Approach 1:
The patent implements a moveable edge ring system that can be raised and lowered relative to the substrate support using lift pins and guide channels. This dynamic configuration allows the edge ring position to be adjusted during processing, enabling optimization of etch uniformity and plasma confinement without compromising manufacturing simplicity.
Solution Approach 2:
The patent changes the positional parameter of the edge ring by introducing a moveable support system with adjustable height. The edge ring can be positioned at different heights relative to the substrate support, allowing optimization of process parameters such as plasma confinement and gas flow patterns to achieve uniform etching.
2Reliability
If a moveable edge ring system is implemented, then etch uniformity improves and plasma leakage is prevented, but device complexity increases
Solution Approach 1:
The patent divides the support structure into multiple components: a bottom ring, a moveable edge ring, and intermediate support elements including lift pins and guide channels. This segmentation allows each component to perform its specific function while maintaining overall system reliability for plasma leakage prevention.
Solution Approach 2:
The patent introduces intermediary elements such as lift pins and guide channels that mediate between the bottom ring and the edge ring. These intermediaries enable controlled movement and positioning of the edge ring, ensuring reliable plasma leakage prevention while managing the complexity through modular design.
3Object-affected harmful factors
If the edge ring is made moveable with adjustable height, then plasma leakage is reduced through labyrinthine interface, but the structure becomes more complex
Solution Approach 1:
The patent employs a nested structure where the moveable edge ring is supported by the bottom ring and optionally a middle ring. The lift pins and guide channels are nested within the bottom ring structure, creating a compact multi-functional assembly that reduces plasma leakage while managing structural complexity through hierarchical organization.
Solution Approach 2:
The patent adds the vertical dimension to the edge ring positioning by implementing height adjustability through the bottom ring and middle ring structure. This dimensional change enables the creation of a labyrinthine interface that effectively prevents plasma leakage, transforming a two-dimensional planar structure into a three-dimensional configurable system.
Data Source
AI summary
A bottom ring is configured to support a moveable edge ring that is configured to be raised and lowered relative to a substrate support. The bottom ring includes a ring body including an upper surface and a lower surface and includes a plurality of vertical guide channels configured to receive a plurality of lift pins, respectively, for raising and lowering the moveable edge ring. Each of the plurality of vertical guide channels extends from the lower surface to the upper surface. The plurality of vertical guide channels include a first diameter adjacent to the upper surface and a second diameter, greater than the first diameter, adjacent to the lower surface. A lip extends radially outwardly from the ring body adjacent to the upper surface