Moveable Edge Ring Arrangement for Continuous Etching Uniformity
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Solution Overview
Problem
Existing substrate processing systems require opening the processing chamber to alter or replace edge coupling rings, which is undesirable due to the need for maintaining a controlled environment and the inconvenience of stopping the etching process for chamber opening.
Innovation Solution
A substrate processing system with actuators and a lifting ring mechanism that allows the edge coupling ring to be moved vertically and horizontally without opening the processing chamber, enabling adjustments to the edge coupling effect and automatic replacement based on erosion detection, allowing for continuous etching with improved uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the edge coupling ring is made fixed and integrated with the pedestal, then the structural stability is improved, but the adaptability deteriorates because the edge coupling effect cannot be altered without opening the processing chamber
Solution Approach 1:
The edge coupling ring is transformed from a fixed component to a movable one through the introduction of an actuator mechanism. The ring can be dynamically adjusted in position relative to the pedestal, enabling real-time modification of the edge coupling effect during substrate processing without requiring chamber opening.
Solution Approach 2:
The system is divided into separable components: the pedestal, the edge coupling ring, and the actuator mechanism. This segmentation allows the edge coupling ring to be independently controlled and adjusted, providing adaptability while maintaining the stability of the overall structure through modular design.
2Adaptability or versatility
If the edge coupling ring is made replaceable, then the adaptability is improved, but the device complexity worsens because additional mechanisms are needed for replacement
Solution Approach 1:
The actuator mechanism enables the edge coupling ring to be automatically positioned and replaced without manual intervention. The system serves itself by using automated control to handle the replacement process, reducing the need for complex manual replacement mechanisms and minimizing chamber opening requirements.
Solution Approach 2:
The actuator serves as an intermediary mechanism between the control system and the edge coupling ring. It simplifies the replacement process by providing a dedicated mechanism for controlled movement and positioning, reducing the overall system complexity compared to direct manual replacement.
3Adaptability or versatility
If the processing chamber is opened to replace or adjust the edge coupling ring, then the adaptability is improved, but the loss of time worsens due to stopping the etching process
Solution Approach 1:
The actuator mechanism enables continuous adjustment and replacement of the edge coupling ring during substrate processing without interrupting the etching process. The useful action of plasma etching continues uninterrupted while the edge coupling ring is dynamically adjusted or replaced, eliminating downtime associated with chamber opening.
Solution Approach 2:
The actuator mechanism is pre-installed and configured to enable quick adjustment or replacement of the edge coupling ring. This preliminary preparation allows for rapid modification without requiring time-consuming chamber opening procedures, maintaining continuous processing operation.
4Device complexity
If the edge coupling ring position is fixed, then the device complexity is reduced, but the manufacturing precision deteriorates because erosion cannot be corrected
Solution Approach 1:
The edge coupling ring position is made dynamic through the actuator mechanism, allowing real-time compensation for erosion and wear. This dynamic adjustment capability maintains precise control over the edge coupling effect, ensuring consistent etching uniformity throughout the substrate processing lifecycle without requiring complex pre-compensation designs.
Solution Approach 2:
The system incorporates monitoring and adjustment capabilities that detect changes in edge coupling ring condition and automatically adjust the ring position to maintain optimal performance. This feedback mechanism ensures consistent etching precision even as the ring undergoes erosion, eliminating the need for overly complex preventive design measures.
Data Source
AI summary
An edge ring arrangement for a processing chamber includes a first ring configured to surround and overlap a radially outer edge of an upper plate of a pedestal arranged in the processing chamber, a second ring arranged below the first moveable ring, wherein a portion of the first ring overlaps the second ring, a first actuator configured to actuate a first pillar to selectively move the first ring to a raised position and a lowered position relative to the pedestal, and a second actuator configured to actuate a second pillar to selectively move the second ring to a raised position and a lowered position relative to the pedestal.