Moveable Injector Vapor Phase Precursor Delivery System

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Solution Overview

Problem

Vapor phase precursor delivery systems in vapor phase deposition apparatuses face challenges due to low vapor pressure of solid precursors and variability in precursor levels, leading to reduced productivity as the delivery of precursors is sensitive to the precursor level in the vessel.

Innovation Solution

A vapor phase precursor delivery system with a moveable injector connected to a flexible connecting tube, allowing for a constant gas flow over the precursor surface, independent of the precursor level, ensuring consistent vaporization and delivery.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a fixed gas inlet is used in the vessel, then the structure is simple, but the precursor delivery becomes sensitive to precursor level variations

Engineering Contradiction:
Improveprecursor delivery consistencyVSAvoiddelivery system structure
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The gas inlet is made moveable via an injector system that can dynamically adjust its position within the vessel. This allows the gas inlet to follow the precursor level changes, maintaining consistent gas flow over the precursor surface regardless of the precursor level, thereby resolving the contradiction between operational consistency and structural simplicity.

Inventive Principle:
Principle #15Dynamics

2Productivity

If the gas inlet position is fixed, then the device complexity is low, but the productivity decreases due to sensitivity to precursor level

Engineering Contradiction:
Improvedeposition apparatus productivityVSAvoidinjector system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The moveable injector system enables dynamic adaptation to precursor level changes, ensuring consistent precursor vaporization and delivery. This dynamic positioning capability maintains optimal gas flow conditions throughout the deposition process, preventing productivity loss while accepting increased system complexity.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The flexible connecting tube acts as an intermediary element that transmits gas flow from the external gas source to the moveable injector. This flexible connection enables the injector to move freely within the vessel while maintaining gas supply, facilitating the dynamic positioning required for consistent precursor delivery.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If a moveable injector with flexible tube is used, then precursor delivery consistency is improved, but the device complexity increases

Engineering Contradiction:
Improveprecursor delivery reliabilityVSAvoidmoveable injector system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The moveable injector system provides dynamic positioning capability that adapts to changing precursor levels. This ensures reliable and consistent precursor delivery by maintaining optimal gas flow conditions throughout the deposition process, justifying the increased system complexity through improved operational reliability.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution maintains a constant quantity of precursor vaporization and delivery, reducing the impact of precursor level variations and enhancing the productivity of the deposition apparatus by stabilizing the precursor delivery process.

Implementation Method 1

delivering a vapor phase precursor for depositing a layer on a substrate in a vapor phase deposition apparatus

Methodology Applied
Scientific EffectVaporization: Evaporation

Implementation Method 2

the vapor pressure of the precursor may be very low

Methodology Applied
Scientific EffectVapor pressure: Vapour Pressure

Data Source

PatentUS20240141485A1Vapor phase precursor delivery system
Publication Date: 2024.05.02 ASM IP HLDG BV
  • US20240141485A1 patent drawing
  • US20240141485A1 patent drawing

AI summary

A vapor phase precursor delivery system for delivering a vapor phase precursor for depositing a layer in a vapor phase deposition apparatus is disclosed. The vapor phase precursor delivery system having: a gas outlet; a gas inlet; a vessel constructed and arranged for storing a precursor; and a connecting tube contained within the vessel. The connecting tube may be connected to and in fluid communication with the gas inlet. A vapor phase deposition apparatus, such as for example a vertical furnace may have such a vapor phase precursor delivery system for depositing a layer on a substrate.