Moving Meniscus Film Deposition with In-Situ Photopolymerisation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for producing polymer films with predetermined spatial structures require additional processing steps, such as lithography, which are time-consuming and costly, and are not compatible with large-format production on flexible substrates.
Innovation Solution
An apparatus and method that utilize a moving meniscus to apply a liquid solution between a guiding element and a substrate, activating a photochemical reaction with structured electrodes and/or alternating fields to form precise patterns directly during film deposition, without the need for additional masks or complex preparation steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If lithography methods are used to produce polymer films with predetermined spatial structures, then manufacturing precision is improved, but device complexity and production time increase
Solution Approach 1:
The patent extracts and removes the lithography step from the conventional polymer film production process. Instead of using complex lithography methods to define patterns, the invention directly deposits polymer material in the desired spatial configuration through controlled dispensing and curing, eliminating masks, aligners, and multiple processing steps while maintaining manufacturing precision
Solution Approach 2:
The invention performs preliminary action by pre-planning the entire spatial structure in digital form before production. The 3D model and toolpath are prepared in advance, allowing the dispensing system to directly trace the desired pattern without requiring real-time lithographic processing, thus simplifying the manufacturing process
2Stability of the object's composition
If spin-coating method is used to produce polymer films, then film uniformity is improved, but substrate size is limited
Solution Approach 1:
The patent segments the film deposition process into multiple localized zones that can be independently controlled. The dispensing system moves across the substrate in a systematic pattern, depositing material segment by segment along the predefined toolpath. This allows the process to scale to large substrate areas while maintaining uniformity through consistent dispensing parameters at each location
Solution Approach 2:
The invention introduces dynamic control to the deposition process. The dispensing system can adjust its position, speed, and deposition rate in real-time based on the substrate area and desired film properties. This dynamic adaptability allows the same system to handle both small and large substrates effectively, overcoming the area limitations of static spin-coating methods
3Manufacturing precision
If additional processing steps are introduced to produce structured films, then manufacturing precision is improved, but productivity decreases
Solution Approach 1:
The patent merges multiple processing steps into a single integrated operation. The dispensing, patterning, and curing steps that are typically separate in conventional processes are combined into one continuous operation. The system deposits material and cures it in sequence without interruption, eliminating the need for separate lithography, development, and rinsing steps, thus maintaining precision while improving productivity
Solution Approach 2:
The invention creates a universal platform that can produce various film structures without requiring additional specialized equipment or processing steps. The same dispensing and curing system can generate different patterns and structures by simply changing the digital toolpath and deposition parameters, eliminating the need for multiple dedicated processing lines and improving overall productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of large-format polymer films with predetermined spatial structures efficiently, reducing material costs and streamlining the process by allowing direct pattern formation on flexible substrates using roll-to-roll technology.
Implementation Method 1
activating a photochemical reaction with structured electrodes and/or alternating fields to form precise patterns directly during film deposition
Implementation Method 2
a moving meniscus to apply a liquid solution between a guiding element and a substrate
Data Source
Figure 1
Figure 2
Figure 3a~3i
AI summary
An apparatus that includes:a platform (12) for a substrate (22); a guiding element (8) that is movable with respect to the platform (12) and spreads a liquid over the substrate (22) to form a meniscus (21); an activating element (11, 14, 15, 16, 17) that changes physicochemical parameters of the liquid in the meniscus (21) and/or on the substrate covered by the liquid in the meniscus (21), wherein the activating element (11, 14, 15, 16, 17) is coupled with the guiding element (8); and wherein the guiding element is a rotationally asymmetrical solid (8B, 8C, 8D).