Moving Target Sputtering for Flexible Indium Tin Oxide Films

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Solution Overview

Problem

Existing methods for manufacturing indium tin oxide (ITO) using a stationary target result in a rigid and less conductive film, which can crack easily when distorted, limiting its application in flexible substrates and devices.

Innovation Solution

A method involving the sputtering of indium and tin from a moving target onto a substrate, where the target moves along a path over the substrate to form multiple layers of ITO, allowing for concurrent sputtering and annealing, which enhances conductivity and flexibility.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a stationary target is used during sputtering, then the manufacturing process is simpler, but the resulting indium tin oxide film has higher sheet resistance and lower conductivity

Engineering Contradiction:
Improvesimplicity of sputtering processVSAvoidconductivity of indium tin oxide film
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent applies the dynamics principle by transitioning from a stationary target to a moving target during sputtering. The target moves along a path over the substrate, creating dynamic deposition conditions that produce multiple overlapping layers with varying orientations. This dynamic approach reduces sheet resistance to less than 0.5 Ω/□ and improves conductivity compared to stationary target methods.

Inventive Principle:
Principle #15Dynamics

2Ease of operation

If a stationary target is used during sputtering, then the process is easier to control, but the film becomes rigid and cracks easily when distorted

Engineering Contradiction:
Improvecontrollability of sputtering processVSAvoidflexibility of indium tin oxide film
Core Design Contradiction:
Ease of operationVSStrength

Solution Approach 1:

The moving target creates dynamic deposition patterns that result in a more flexible film structure. The target moves along a path and may complete multiple cycles, depositing material in a way that creates overlapping layers with reduced internal stress. This dynamic process produces films that can withstand distortion without cracking, enabling use in flexible substrates.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent applies segmentation by creating multiple layers of indium tin oxide through the moving target process. Each pass of the target deposits a layer, and multiple cycles create stacked layers with different orientations and properties. This segmented structure improves overall film flexibility and reduces crack propagation compared to a single rigid layer.

Inventive Principle:
Principle #1Segmentation

3Reliability

If the target moves along a path over the substrate, then multiple layers are formed with improved conductivity, but the device complexity increases

Engineering Contradiction:
Improveconductivity of indium tin oxide filmVSAvoidcomplexity of sputtering system
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent implements a moving target system that travels along a defined path over the substrate during sputtering. This dynamic configuration, while more complex than a stationary target, achieves sheet resistance of less than 0.5 Ω/□ through the creation of multiple overlapping layers with optimized deposition angles and coverage.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method achieves a low sheet resistance of less than 0.5 Ω/□, increased flexibility, and improved conductivity, making the indium tin oxide film suitable for use in flexible substrates and devices such as display devices, electrochromic windows, and flying vehicles.

Implementation Method 1

a method involving the sputtering of indium and tin from a moving target onto a substrate

Methodology Applied
Scientific EffectSputtering: Sputtering

Implementation Method 2

a portion of the indium tin oxide anneals as the target moves away from the portion of the indium tin oxide

Methodology Applied
Scientific EffectAnnealing: Annealing

Data Source

PatentUS12338525B2Transparent conducting indium doped tin oxide
Publication Date: 2025.06.24 PPG INDUSTRIES OHIO INC
  • US12338525B2 patent drawing
  • US12338525B2 patent drawing
  • US12338525B2 patent drawing

AI summary

A method of manufacturing indium tin oxide includes sputtering indium and tin from a target onto a substrate, the sputtering including moving the target along a path over the substrate. The indium tin oxide may have a sheet resistance less than 0.5 Ω/□. An indium film includes: a first moving target sputtered indium tin oxide layer; a second moving target sputtered indium tin oxide layer on the first moving target sputtered indium tin oxide layer; and a third moving target sputtered indium tin oxide layer on the second moving target sputtered indium tin oxide layer. A transparency includes the indium tin oxide, and a flying vehicle includes the transparency.