MPCVD Single Crystal Diamond Growth Rate and Optical Purity

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Solution Overview

Problem

Current methods for producing large, high-purity single crystal diamonds through chemical vapor deposition (CVD) are limited by slow growth rates and the need for subsequent annealing steps, which hinder the production of clear, colorless, high optical quality diamonds.

Innovation Solution

A microwave plasma assisted chemical vapor deposition (MPCVD) technique that grows single-crystal diamonds at high rates (up to 200 μm/hr) without an annealing step, using a substrate orientation 5-10 degrees off {100} and maintaining a growth temperature of 1250-1350°C, while ensuring nitrogen is excluded from the deposition chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If standard CVD processes are used to produce single crystal diamond, then high optical quality and colorless properties are achieved, but growth rates are limited to only a few micrometers per hour

Engineering Contradiction:
Improvegrowth rateVSAvoidproduction time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The invention changes the substrate orientation parameter from exact {100} to 5-10 degrees off {100}, and adjusts the growth temperature to 1250-1350°C. These parameter changes enable dramatically higher growth rates (up to 200 μm/hr) while maintaining single crystal quality and optical properties, resolving the contradiction between productivity and production time.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If high growth rates are achieved through MPCVD, then productivity increases, but subsequent annealing steps are required to achieve high optical quality

Engineering Contradiction:
Improvegrowth rateVSAvoidprocess complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The invention performs preliminary action by optimizing the deposition conditions during the CVD growth process itself. By controlling substrate orientation (5-10 degrees off {100}), temperature (1250-1350°C), and excluding nitrogen, the process produces high optical quality diamond directly during growth, eliminating the need for subsequent annealing steps and reducing overall process complexity.

Inventive Principle:
Principle #10Preliminary action

3Productivity

If substrate orientation is exactly {100} for single crystal growth, then crystal quality is maintained, but growth rates remain limited

Engineering Contradiction:
Improvegrowth rateVSAvoidcrystal orientation precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The invention deliberately changes the substrate orientation parameter from the conventional exact {100} orientation to 5-10 degrees off {100}. This parameter change, combined with elevated temperature (1250-1350°C), enables much faster growth rates while still producing high quality single crystals with excellent optical properties, resolving the contradiction between productivity and manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

4Shape

If nitrogen is added to enhance {100} facet growth, then surface smoothness improves, but colorless optical quality deteriorates

Engineering Contradiction:
Improvesurface smoothnessVSAvoidcoloration
Core Design Contradiction:
ShapeVSObject-affected harmful factors

Solution Approach 1:

The invention uses the substrate orientation (5-10 degrees off {100}) and elevated temperature (1250-1350°C) as intermediaries to achieve both surface smoothness and colorless optical quality. This intermediary approach allows the growth of smooth {100} facets without adding nitrogen, which would cause coloration, thereby resolving the contradiction between shape quality and optical purity.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the production of large, high optical quality, colorless single crystal diamonds above 12 mm thickness with improved mechanical and optical properties, overcoming limitations of previous CVD methods by achieving high growth rates and clarity without visible layers or impurities.

Implementation Method 1

a microwave plasma assisted chemical vapor deposition (MPCVD) technique to produce large diamond single-crystals

Methodology Applied
Scientific EffectMicrowave plasma: Plasma

Implementation Method 2

microwave plasma assisted chemical vapor deposition (MPCVD) technique

Methodology Applied
Scientific EffectChemical vapor deposition: Chemical Vapour Deposition

Data Source

PatentUS9023307B2Production of large, high purity single crystal CVD diamond
Publication Date: 2015.05.05 CARNEGIE INSTITUTION OF WASHINGTON
  • US9023307B2 patent drawing
  • US9023307B2 patent drawing
  • US9023307B2 patent drawing

AI summary

The invention relates to single crystal diamond with high optical quality and methods of making the same. The diamond possesses an intensity ratio of the second-order Raman peak to the fluorescence background of around 5 or greater.