MPS Diode Well Spacing Layout for Uniform Surge Current

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Solution Overview

Problem

MPS diodes face challenges with high on-state voltage drop and limited forward surge current capability due to non-uniform current conduction, leading to local heating and reduced long-term operation, primarily caused by varying spacing between wells which affects voltage distribution across PN junctions.

Innovation Solution

The MPS diode design features an increasing spacing between adjacent wells from the center to the edge of the active area, ensuring uniform current flow and dopant concentration profiles to maintain Schottky current, thereby improving on-state voltage and forward surge current capability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If uniform spacing between wells is used, then manufacturing is simple, but current conduction is non-uniform causing high on-state voltage drop

Engineering Contradiction:
Improvewell spacing uniformityVSAvoidon-state voltage drop
Core Design Contradiction:
Ease of manufactureVSLoss of energy

Solution Approach 1:

The patent applies local quality by varying the spacing between adjacent wells in different regions of the active area. Specifically, the spacing is made smaller in regions where higher current density is expected and larger in regions where lower current density occurs, thereby optimizing current distribution locally throughout the device structure.

Inventive Principle:
Principle #3Local quality

2Device complexity

If uniform spacing between wells is used, then device structure is simple, but forward surge current capability is limited due to local heating

Engineering Contradiction:
Improvewell spacing configurationVSAvoidforward surge current capability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent applies local quality by varying the spacing between adjacent wells in different regions of the active area. Specifically, the spacing is made smaller in regions where higher current density is expected and larger in regions where lower current density occurs, thereby optimizing current distribution locally throughout the device structure.

Inventive Principle:
Principle #3Local quality

3Productivity

If smaller spacing between wells is used, then more Schottky contacts are formed improving current conduction, but voltage distribution becomes non-uniform across PN junctions

Engineering Contradiction:
Improvecurrent conduction efficiencyVSAvoidvoltage distribution uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by varying the spacing between adjacent wells in different regions of the active area. Specifically, the spacing is made smaller in regions where higher current density is expected and larger in regions where lower current density occurs, thereby optimizing current distribution locally throughout the device structure.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent applies parameter changes by systematically varying the spacing parameter between adjacent wells across different regions of the active area. This spatial variation in the spacing parameter enables uniform voltage distribution across all PN junctions while maintaining efficient current conduction through optimized Schottky contact formation.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design enhances current uniformity, reducing voltage drops and increasing the forward surge current capability, thus improving the power handling and longevity of the MPS diode.

Implementation Method 1

a plurality of wells of a second conductivity type different from the first conductivity type, the plurality of wells being mutually spaced apart, each well forming a respective PN-junction with the drift region

Methodology Applied
Scientific EffectPN junction depletion region:

Implementation Method 2

the metal layer assembly forming a plurality of Schottky contacts together with the drift region

Methodology Applied
Scientific EffectSchottky contact:

Data Source

PatentEP4340035A1MPS diode having non-uniformly spaced wells and method for manufacturing the same
Publication Date: 2024.03.20 NEXPERIA BV
  • EP4340035A1 patent drawingFigure 1
  • EP4340035A1 patent drawingFigure 2
  • EP4340035A1 patent drawingFigure 3~4

AI summary

Aspects of the present disclosure generally relate to an MPS diode and a manufacturing method therefor. The MPS diode comprises a semiconductor body including an active area, wherein the active area comprises a drift region of a first conductivity type, and a plurality of wells of a second conductivity type different from the first conductivity type, the plurality of wells being mutually spaced apart, each well forming a respective PN-junction with the drift region. The MPS diode further comprises a metal layer assembly arranged on a surface of the semiconductor body and comprising at least one metal layer, the metal layer assembly forming a plurality of Schottky contacts together with the drift region and a plurality of respective Ohmic contacts with the plurality of wells. A spacing between adjacently arranged wells increases in an outward direction from a center of the active area.