Multiple Patterning Match-Sensitive Feature Coloring
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Solution Overview
Problem
Existing multiple patterning technology (MPT) methods lead to device performance degradation due to routing and characteristic variations when match-sensitive features are split across multiple masks, resulting in process variations and symmetry issues during integrated circuit fabrication.
Innovation Solution
Identifying match-sensitive features before decomposition and assigning them the same color, ensuring they are formed in the same lithography process, while randomly assigning other features to minimize performance variations and maintain symmetry.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple patterning technology is used to improve pattern resolution, then pattern resolution is improved, but device performance degrades due to routing and characteristic variations
Solution Approach 1:
The patent segments features into two categories: match-sensitive features (assigned the first color and formed on the first mask) and non-match-sensitive features (assigned the second color and formed on the second mask). This segmentation allows match-sensitive features to be processed together in one lithography step, avoiding the performance degradation caused by splitting them across multiple steps while still achieving high pattern resolution through multiple patterning.
2Measurement precision
If features are split into multiple masks for multiple patterning, then pattern resolution is improved, but manufacturing complexity increases
Solution Approach 1:
The patent extracts match-sensitive features from the general feature set and assigns them a dedicated color (first color) that ensures they are all formed on the same mask. This extraction simplifies the coloring process by separating features that require special handling from those that can be processed conventionally, reducing the overall complexity of mask preparation.
Solution Approach 2:
The patent applies different coloring rules to different types of features: match-sensitive features receive special treatment (first color) to ensure they are formed together, while non-match-sensitive features receive conventional coloring (second color). This local differentiation optimizes the coloring process for each feature type's specific requirements, simplifying the overall mask preparation.
3Reliability
If match-sensitive features are assigned the same color, then device performance is improved, but coloring complexity increases
Solution Approach 1:
The patent performs preliminary identification and assignment of the first color to all match-sensitive features before proceeding with the coloring of non-match-sensitive features. This preliminary action ensures that match-sensitive features are locked into their assigned mask group early in the process, simplifying subsequent coloring steps and reducing the overall complexity of the coloring process.
Data Source
AI summary
The present disclosure provides for many different embodiments of a multiple patterning technology method and system. An exemplary method includes receiving a pattern layout having a plurality of features; coloring each of the plurality of features one of at least two colors, thereby forming a colored pattern layout, wherein the coloring includes coloring match-sensitive features a same color; and fabricating at least two masks with the features of the colored pattern layout, wherein each mask includes features of a single color.