Feature Pattern Layout for MR Viewpoint Measurement Accuracy

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Solution Overview

Problem

Existing methods for calculating the position and orientation of a measurement viewpoint in MR and AR systems require trial and error to arrange feature patterns, making the process time-consuming and inefficient.

Innovation Solution

An information processing apparatus and method that calculates a feature distribution in an environment, decides on a feature pattern and layout position to enhance accuracy, and presents the pattern and position to the user, allowing for automated and efficient layout of features.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If trial and error method is used to arrange feature patterns, then the accuracy of position and orientation calculation can be improved, but the time required for the task increases significantly

Engineering Contradiction:

Improveaccuracy of position and orientation calculationVSAvoidtime required for feature pattern arrangement

Core Design Contradiction:

Measurement precisionVSLoss of time

Solution Approach 1:

The system performs preliminary calculation of feature distribution and proactively determines the optimal layout positions of feature patterns before actual measurement begins. This eliminates the need for trial-and-error arrangement during the measurement process, thereby reducing time loss while maintaining calculation accuracy.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The system automatically calculates and determines the optimal feature pattern layout without requiring manual trial-and-error adjustment by operators. The automated determination of layout positions based on feature distribution calculations enables the system to serve itself, eliminating time-consuming manual intervention.

Inventive Principle:

Principle #25Self-service

2Measurement precision

If feature patterns are arranged densely to improve measurement accuracy, then the accuracy of position and orientation calculation increases, but the complexity of the layout process increases

Engineering Contradiction:

Improveaccuracy of position and orientation calculationVSAvoidcomplexity of feature pattern layout

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The system calculates feature distribution based on environmental parameters and automatically adjusts the layout parameters of feature patterns accordingly. By dynamically changing layout parameters based on calculated distribution data, the system achieves high measurement accuracy without requiring complex manual layout planning.

Inventive Principle:

Principle #35Parameter changes

3Productivity

If automated determination of feature pattern layout is implemented, then the time required for arrangement is reduced, but the complexity of the system increases

Engineering Contradiction:

Improvespeed of feature pattern arrangementVSAvoidsystem complexity for automated determination

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The system replaces manual mechanical arrangement processes with automated computational determination. By substituting the mechanical trial-and-error arrangement method with computer-based feature distribution calculation and automated layout determination, the system improves productivity while the computational complexity is managed through algorithmic approaches.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Data Source

PatentUS10304206B2Selecting feature patterns and corresponding layout positions for viewpoint measurement

Publication Date: 2019.05.28 CANON KK

AI summary

An information processing apparatus: obtains a feature distribution by calculating a distribution of features, existing in an environment, that can be used to measure a position and orientation of a measurement viewpoint; decides on a feature pattern to be laid out and a layout position of the feature pattern in the environment that enable the obtainment of a feature distribution that enhances an accuracy at which the position and orientation of the measurement viewpoint is calculated; and presents the feature pattern and the layout position of the feature pattern that have been decided on.