MRAM Device with Region-Specific MTJ Switching Current Densities

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Solution Overview

Problem

Developing a magnetoresistive random access memory (MRAM) device that balances low power consumption, high operation speed, and high data retention characteristics is challenging, as increasing switching current density improves data retention but increases power consumption and reduces speed.

Innovation Solution

The method involves forming first and second MTJ structures with different switching current densities on a substrate, using varying materials and crystallinity for lower electrode layers to achieve distinct characteristics in different regions, allowing for high data retention in one region and low power consumption and high operation speed in another.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the switching current density is increased to improve data retention, then data retention characteristic is improved, but power consumption increases and operation speed decreases

Engineering Contradiction:
Improvedata retention characteristicVSAvoidpower consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent applies local quality by forming first and second lower electrode layers with different materials and crystallinity in different regions of the substrate. The first lower electrode layer has higher crystallinity for high data retention applications, while the second lower electrode layer has lower crystallinity for low power consumption and high speed applications. This allows each region to be optimized for its specific function without compromising the other regions' performance.

Inventive Principle:
Principle #3Local quality

2Reliability

If the switching current density is increased to improve data retention, then data retention characteristic is improved, but operation speed decreases

Engineering Contradiction:
Improvedata retention characteristicVSAvoidoperation speed
Core Design Contradiction:
ReliabilityVSSpeed

Solution Approach 1:

The patent implements local quality by creating spatially differentiated lower electrode layers with distinct crystallinity levels. Regions requiring high data retention utilize the first lower electrode layer with higher crystallinity, while regions prioritizing operation speed utilize the second lower electrode layer with lower crystallinity. This regional differentiation enables simultaneous optimization of both data retention and operation speed across different parts of the same device.

Inventive Principle:
Principle #3Local quality

3Adaptability or versatility

If different MTJ structures with different switching current densities are formed in different regions, then tailored characteristics are achieved, but device complexity increases

Engineering Contradiction:
Improvetailored characteristics in different regionsVSAvoidfabrication process complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent employs parameter changes by varying the crystallinity parameter of the lower electrode layers through controlled formation processes. By adjusting crystallinity levels in different regions, the patent achieves different switching current densities and performance characteristics without fundamentally changing the device structure or requiring entirely different fabrication processes for each region.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS11659770B2Semiconductor device, magnetoresistive random access memory device, and semiconductor chip including the same
Publication Date: 2023.05.23 SAMSUNG ELECTRONICS CO LTD
  • US11659770B2 patent drawing
  • US11659770B2 patent drawing
  • US11659770B2 patent drawing

AI summary

In a method of manufacturing an MRAM device, first and second lower electrodes may be formed on first and second regions, respectively, of a substrate. First and second MTJ structures having different switching current densities from each other may be formed on the first and second lower electrodes, respectively. First and second upper electrodes may be formed on the first and second MTJ structures, respectively.