MTJ Sensor Layout for Compact Temperature-Stable MRAM

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Solution Overview

Problem

Current magnetoresistive random access memory (MRAM) devices face challenges such as high chip area, high cost, high power consumption, and sensitivity to temperature variations, limiting their effectiveness in magnetic field sensing applications.

Innovation Solution

A method for fabricating a semiconductor device involving the formation of a magnetic tunneling junction (MTJ) structure with specific layers and processes, including a first inter-metal dielectric layer, metal interconnections, a pinned layer, a sacrificial layer, and subsequent patterning and etching steps to create a semiconductor device with improved magnetic tunneling junctions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional MRAM devices are used for magnetic field sensing, then magnetic field sensing capability is achieved, but chip area is large, cost is high, power consumption is high, and temperature stability is poor

Engineering Contradiction:
Improvemagnetic field sensing sensitivityVSAvoidchip area
Core Design Contradiction:
Measurement precisionVSArea of stationary object

Solution Approach 1:

The patent segments the magnetic field sensing function into multiple MTJ devices arranged in a specific pattern (e.g., bridge configuration with four MTJ devices). This segmentation allows each individual MTJ device to be smaller while collectively achieving the required sensing precision through differential measurement, thereby reducing overall chip area while maintaining or improving sensitivity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs nested layering of multiple functional layers within each MTJ device structure, including bottom electrode layer, barrier layer, free layer, and top electrode layer. This vertical nesting allows high-density integration of multiple functional components in a compact footprint, improving sensing precision without proportionally increasing chip area.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Measurement precision

If conventional MRAM devices are used, then magnetic field sensing is achieved, but manufacturing cost is high

Engineering Contradiction:
Improvemagnetic field sensing sensitivityVSAvoidmanufacturing cost
Core Design Contradiction:
Measurement precisionVSEase of manufacture

Solution Approach 1:

The patent divides the sensing function across multiple identical MTJ device units that can be manufactured using the same process flow. This segmentation into repeatable modular units simplifies manufacturing planning and reduces per-unit cost through standardization, while the collective arrangement maintains high sensing precision.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent optimizes the thickness and material composition parameters of each MTJ layer (e.g., barrier layer thickness, free layer thickness) to achieve the desired magnetic properties and sensing performance. By carefully controlling these parameters, the device achieves high precision with standardized manufacturing processes, reducing the need for costly trial-and-error fabrication.

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If conventional MRAM devices are used, then magnetic field sensing capability is provided, but power consumption is high

Engineering Contradiction:
Improvemagnetic field sensing sensitivityVSAvoidpower consumption
Core Design Contradiction:
Measurement precisionVSUse of energy by moving object

Solution Approach 1:

The patent implements a segmented sensing architecture where multiple MTJ devices operate in a differential configuration. This segmentation allows the system to detect magnetic field changes through differential resistance measurements, which consumes less power than absolute measurements, while maintaining high sensing precision through the combined output of multiple devices.

Inventive Principle:
Principle #1Segmentation

4Measurement precision

If conventional MRAM devices are used, then magnetic field sensing is achieved, but temperature stability is poor

Engineering Contradiction:
Improvemagnetic field sensing sensitivityVSAvoidtemperature stability
Core Design Contradiction:
Measurement precisionVSStability of the object's composition

Solution Approach 1:

The patent uses a segmented differential measurement approach with multiple MTJ devices exposed to different magnetic field conditions (e.g., reference and sensing elements). This segmentation allows the system to subtract out common-mode temperature drift effects, maintaining measurement precision while achieving temperature stability through differential cancellation of thermal variations.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The approach results in a more compact, cost-effective, and temperature-stable MRAM device with enhanced sensitivity, addressing the limitations of existing MRAM technologies.

Implementation Method 1

Magnetoresistance (MR) effect has been known as a kind of effect caused by altering the resistance of a material through variation of outside magnetic field. The physical definition of such effect is defined as a variation in resistance obtained by dividing a difference in resistance under no magnetic interference by the original resistance.

Methodology Applied
Scientific EffectMagnetoresistance effect: Magnetoresistance

Implementation Method 2

The aforementioned MR effect has also been used in magnetic field sensor areas including but not limited to for example electronic compass components used in global positioning system (GPS) of cellular phones

Methodology Applied
Scientific EffectMagnetic anisotropy: Anisotropy

Data Source

PatentUS11765982B2Semiconductor device and method for fabricating the same
Publication Date: 2023.09.19 UNITED MICROELECTRONICS CORP
  • US11765982B2 patent drawing
  • US11765982B2 patent drawing
  • US11765982B2 patent drawing

AI summary

A method for fabricating semiconductor device includes the steps of: forming a first inter-metal dielectric (IMD) layer on a substrate; forming a metal interconnection in the first IMD layer; forming a bottom electrode layer and a pinned layer on the first IMD layer; forming a sacrificial layer on the pinned layer; patterning the sacrificial layer, the pinned layer, and the bottom electrode layer to form a first magnetic tunneling junction (MTJ); forming a second IMD layer around the first MTJ; and removing the sacrificial layer.