Multi-Angle Lithography for 3D Polymer Waveguide Alignment
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Solution Overview
Problem
Conventional photolithography struggles with achieving sub-micron level accuracy in z-direction alignment, which is crucial for efficient single-mode light signal coupling in polymer waveguides and other semiconductor components, making high-volume manufacturing of silicon photonic packages costly and inefficient.
Innovation Solution
A lithographic patterning system using two angled actinic radiation sources with masks to control the x-, y-, and z-positions of the exposed cross-section, enabling precise 3D positional control by adjusting the angles and positions of the light exposures to form semiconductor components like waveguides and lenses with high alignment accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography with vertical projection is used, then the process is simple and cost-effective, but z-direction alignment accuracy cannot achieve sub-micron level required for single-mode light signal coupling
Solution Approach 1:
The patent transitions from conventional vertical projection (single dimension) to multi-angle oblique illumination (multiple dimensions). By introducing oblique incident angles in addition to the traditional vertical direction, the system achieves precise 3D positional control including z-direction alignment that was previously unattainable with vertical projection alone.
Solution Approach 2:
The patent divides the illumination into multiple independent light sources or beams incident from different angles. Each light source can be independently controlled and positioned, allowing separate optimization of x, y, and z coordinates through the combined effect of multiple angled projections rather than a single vertical beam.
2Manufacturing precision
If multiple angled light sources are introduced to achieve precise 3D positional control, then alignment accuracy for single-mode coupling is achieved, but the system complexity and manufacturing cost increase
Solution Approach 1:
The multi-angle lithography system is designed to perform multiple functions: it achieves precise 3D positional control for single-mode coupling, produces various semiconductor components (waveguides, tapers, lenses, curved mirrors), and maintains compatibility with existing photolithography processes. This multi-functionality justifies the increased complexity by delivering comprehensive manufacturing capabilities.
Solution Approach 2:
The system controls the incident angles and positions of multiple light sources as adjustable parameters to achieve the desired 3D exposure patterns. By optimizing these angular and positional parameters, the system achieves sub-micron alignment accuracy while maintaining process flexibility for different component types.
3Manufacturing precision
If conventional lithography is used for polymer waveguide fabrication, then the process is straightforward, but alignment accuracy for single-mode light signal coupling cannot be achieved
Solution Approach 1:
The patent applies multi-angle oblique illumination to polymer waveguide fabrication, adding angular dimensionality control to achieve precise z-positioning of the exposed cross-section. This enables sub-micron alignment accuracy in the z-direction, which is critical for single-mode coupling in polymer waveguides, while maintaining the simplicity of polymer-based materials and processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of semiconductor components with precise 3D positional control, meeting the alignment requirements for silicon photonic packages and facilitating high-volume manufacturing of optical elements such as waveguides, tapers, and lenses with improved efficiency and reduced costs.
Implementation Method 1
a first actinic radiation source, which is configured to propagate light along a first optical axis, a first mask for patterning the propagated light from the first actinic radiation source
Data Source
AI summary
The present disclosure is directed to a lithographic patterning system including a stage for supporting a substrate with a photo-definable polymer layer, a first actinic radiation source, which is configured to propagate light along a first optical axis, a first mask for patterning the propagated light from the first actinic radiation source, a second actinic radiation source, which is configured to propagate light along a second optical axis, and a second mask for patterning the propagated light from the second actinic radiation source. In a method, first and second propagated lights form an intersection in the photo-definable polymer layer, and a patterned semiconductor component is formed at the intersection.