Multi-Anode Vacuum Coating Apparatus for Thick Film Deposition
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional LIHCPA technology faces challenges in achieving high film thickness due to anode surface contamination, which reduces conductivity and plasma formation efficiency, especially when coating non-conductive materials or thick films, leading to decreased deposition thickness and increased deposition time.
Innovation Solution
A vacuum coating apparatus with multiple anodes allows for continuous operation by replacing contaminated anodes during the coating process, ensuring a fresh, clean anode surface is always available for plasma induction, thereby maintaining high plasma formation efficiency and extending the anode lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If LIHCPA technology is used to coat thick films or non-conductive materials, then the anode surface becomes contaminated by plasma, but the conductivity of the anode surface is reduced and plasma formation efficiency decreases
Solution Approach 1:
The patent divides the single anode system into multiple anodes (first anode, second anode, third anode) arranged in different positions around the cathode target. This segmentation allows the system to switch between different anodes, preventing any single anode from becoming excessively contaminated and maintaining reliable plasma formation throughout the coating process.
Solution Approach 2:
The patent implements a mechanism where contaminated anodes are discarded (replaced) with fresh anodes during the coating process. The transiting device carries multiple anodes, and when one anode becomes contaminated, it is automatically replaced by a fresh one, ensuring continuous high conductivity and plasma formation efficiency without manual intervention.
2Productivity
If single anode design is used, then device complexity is low, but deposition time increases and productivity decreases
Solution Approach 1:
The patent transforms the static single anode design into a dynamic multi-anode system where anodes can be automatically switched during operation. The transiting device enables automatic replacement of anodes based on contamination levels, dynamically optimizing the coating process without requiring complex manual intervention or system redesign.
Solution Approach 2:
The system implements self-service through automatic anode replacement. When an anode becomes contaminated, the control system automatically activates the transiting device to replace it with a fresh anode, eliminating the need for manual cleaning or system shutdowns and maintaining high productivity throughout the coating process.
3Duration of action of stationary object
If multiple anodes are used, then anode lifespan is extended and coating efficiency increases, but device complexity and initial cost increase
Solution Approach 1:
The patent implements a nested structure where multiple anodes are positioned concentrically around the cathode target, with each anode occupying a specific radial position. The transiting device is nested within the vacuum chamber structure, allowing smooth operation without requiring external complex mechanisms. This nested arrangement maximizes space utilization and simplifies the overall system architecture.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the deposition of thicker films with increased efficiency, reduces the need for anode cleaning, and allows for coating of both conductive and high-resistance materials, effectively addressing the limitations of single-anode designs.
Implementation Method 1
a pulsed laser beam emitted into excited material (i.e. target material) from the outside of a vacuum chamber and using a pulsed arc discharge device to generate high kinetic energy particles
Implementation Method 2
using a pulsed arc discharge device to generate high kinetic energy particles, thus allowing various gases with high concentrations to be filled into the vacuum chamber for thin film growth
Implementation Method 3
the pulsed arc discharge device, electrically connected to the cathode target and the anode at the working position, functions as a plasma inducer in a vacuum chamber for film coating
Implementation Method 4
The laser beam can scan along a vertical direction (z-direction) via a step motor, such that the range for film-forming can be increased to more than 20 cm
Implementation Method 5
According to the charge and discharge mechanism of the capacitor, a pulsed current of several kiloamps (kA) can be generated during discharge, thereby inducing high energy plasma in the vacuum chamber
Implementation Method 6
This high energy plasma is able to generate highly ionized with high ion kinetic energy from the target
Implementation Method 7
Conventional physical vapor deposition (PVD) technology, such as thermal evaporation, e-beam evaporation, sputtering, or molecular beam epitaxy (MBE), has been utilized for thin film coating
Data Source
AI summary
A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.