Multi-Beam Blanker for Charged Particle Beam Inspection
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Solution Overview
Problem
Charged particle beam devices face limitations in high throughput electron beam inspection due to charging issues in non-conductive areas, leading to image degradation and potential damage from electron beam irradiation, particularly when using multiple beams.
Innovation Solution
A charged particle beam device with a multi-beam blanker system that includes an annular shaped beam dump and an annular shaped electrode, allowing for individual beam blanking and reduction of crosstalk, enabling fast blanking of beamlets without affecting neighboring beams, and a method for operating the device to guide beamlets into the beam dump using a deflection field.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple charged particle beamlets are used to increase inspection throughput, then productivity is improved, but charging artifacts occur on non-conductive areas causing image degradation
Solution Approach 1:
The patent divides the single beam control into multiple independent beamlet controls, allowing selective blanking of individual beamlets that would cause charging artifacts while keeping other beamlets active for inspection, thus maintaining high throughput while preventing image degradation
Solution Approach 2:
The patent applies different operational states to different beamlets based on local sample characteristics - some beamlets are blanked when passing over non-conductive areas while others continue scanning conductive areas, enabling localized problem solving without affecting overall system productivity
2Productivity
If multiple beamlets are scanned simultaneously to increase inspection speed, then productivity is improved, but crosstalk between beamlets affects measurement precision
Solution Approach 1:
The patent segments the beam control system into independent beamlet channels with individual blanking capability, allowing precise control of each beamlet to eliminate crosstalk interference while maintaining simultaneous operation for high-speed inspection
Solution Approach 2:
The patent introduces independent blanking control as an intermediary mechanism between the multi-beam system and the sample, enabling selective suppression of beamlets that would cause crosstalk while maintaining the overall multi-beam scanning operation
3Measurement precision
If electron beam irradiation is increased to improve inspection quality, then measurement precision is improved, but damage to sensitive areas occurs
Solution Approach 1:
The patent divides the beam current distribution across multiple beamlets, allowing the total beam current to be maintained for high-quality inspection while distributing the irradiation load to prevent localized damage to sensitive areas
Solution Approach 2:
The patent enables different beamlet intensities and scanning patterns to be applied to different sample regions, providing high beam current for robust features while reducing irradiation to sensitive areas, thus maintaining inspection quality without causing damage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the throughput of charged particle beam devices by preventing charging artifacts and maintaining image quality across multiple beamlets, allowing for precise inspection without damaging sensitive areas.
Implementation Method 1
an annular shaped electrode provided partially above the annular shaped body having an inner perimeter side and an outer perimeter side
Implementation Method 2
guiding the first beamlet with a first deflection field of a first blanking deflector into an annular shaped body of a charged particle beam dump
Data Source
AI summary
A charged particle beam dump for a charged particle beam device is described. The beam dump includes an annular shaped body having an inner perimeter wall that defines an open annulus for passing of primary charged particle beamlets, the annular shaped body further having an outer perimeter wall and a bottom wall; and an annular shaped electrode provided partially above the annular shaped body having an inner perimeter side and an outer perimeter side, wherein the inner perimeter side is outside of the radius of the inner perimeter wall of the annular shaped body.


