Multi-Beam Exposure Device Aperture and Deflection Layer
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Solution Overview
Problem
Conventional multi-beam exposure devices struggle to accurately machine line patterns with different line widths and pitches, particularly as line patterns become finer, requiring a more stable and precise multi-beam forming device.
Innovation Solution
A device comprising an aperture layer that deforms and passes a beam, and a deflection layer with electrodes that sandwich the beam passing space, allowing for precise control and deflection of charged particle beams to match varying line widths and pitches, enabling the formation of fine line patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional multi-beam forming devices are used, then multi-beam exposure can be performed, but it is difficult to machine line patterns with different line widths and pitches accurately
Solution Approach 1:
The device is divided into multiple independent beam forming units, each capable of forming beams with different parameters. The multi-beam forming device includes first beam forming units for forming first charged particle beams and second beam forming units for forming second charged particle beams, allowing independent control of beam parameters to match different line width and pitch requirements.
Solution Approach 2:
The device incorporates variable focusing lenses with adjustable focal lengths in each beam forming unit. This dynamic adjustment capability allows the beam diameter and focusing characteristics to be changed according to the specific pattern requirements, enabling accurate machining of both wide and narrow line patterns with varying pitches.
2Manufacturing precision
If line patterns become finer, then higher resolution is achieved, but stability of machining deteriorates
Solution Approach 1:
By dividing the multi-beam system into separate beam forming units with independent control, each unit can be optimized for stable beam formation. The first and second beam forming units can independently adjust their parameters to maintain stability even when processing finer patterns, preventing the degradation of machining reliability.
Solution Approach 2:
The device allows dynamic adjustment of beam parameters including acceleration voltage, beam diameter, and focusing conditions. For finer line patterns, the system can adjust the beam diameter to be smaller and modify focusing conditions to maintain beam stability, thereby achieving high resolution without sacrificing machining stability.
3Manufacturing precision
If beam diameter is reduced for finer patterns, then resolution improves, but beam control becomes more difficult
Solution Approach 1:
Each beam forming unit includes a variable focusing lens with adjustable focal length, allowing dynamic optimization of beam parameters. When processing finer patterns, the focal length can be adjusted to maintain appropriate beam diameter and focusing, making beam control easier despite the reduced scale of features being processed.
Solution Approach 2:
The independent beam forming units allow each beam to be controlled separately with optimized parameters. This segmentation enables simpler control of each individual beam at reduced diameters, as each unit can be independently tuned without affecting other beams, thereby maintaining ease of operation even with finer patterns.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables stable machining of fine line patterns with different line widths and pitches, improving the precision and accuracy of multi-beam exposure, overcoming the limitations of existing technologies.
Implementation Method 1
an aperture layer that includes a first aperture that deforms and passes a beam incident thereto
Implementation Method 2
a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section that includes a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section that includes an extending portion that extends toward the beam passing space
Data Source
AI summary
To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.