Multi-beam Pattern Generator Yaw Correction
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Solution Overview
Problem
Large substrates in the flat panel display industry face challenges in precise pattern placement due to distortions and yaw errors, which conventional X-Y stages and photolithography masks are unable to adequately address, leading to pattern placement errors.
Innovation Solution
A multi-beam pattern generator employing a spatial light modulator (SLM) with independently controllable mirrors that compensates for substrate yaw by digitally controlling mirrors to active or inactive positions, ensuring precise pattern placement on large substrates through writing cycles and substrate movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional X-Y stages are used to support large substrates, then substrate support is provided, but mechanical precision is insufficient to control patterning placement error
Solution Approach 1:
The patent replaces the mechanical precision system with an optical-digital correction system. The SLM (spatial light modulator) uses digitally controlled mirrors to compensate for placement errors, substituting mechanical precision requirements with optical field control and digital processing capabilities.
Solution Approach 2:
The patent changes the control parameter from mechanical stage positioning to optical beam steering angles. By adjusting the angular parameters of the light beams reflected by SLM mirrors, the system compensates for substrate placement errors without requiring mechanical precision.
2Manufacturing precision
If photolithography masks are used for patterning, then pattern transfer is achieved, but distortions during operations cause pattern placement errors
Solution Approach 1:
The patent replaces the physical photolithography mask system with a digital optical system. Instead of using a physical mask that suffers from mechanical distortions, the invention uses an SLM with digitally controlled mirrors to define patterns through optical field modulation, eliminating mask-related distortion issues.
Solution Approach 2:
The patent introduces dynamic compensation by continuously adjusting the SLM mirror positions based on real-time substrate placement feedback. This dynamic adjustment allows the system to adapt to operational distortions and maintain pattern placement precision throughout the writing process.
3Area of stationary object
If large substrates are used to increase production area, then manufacturing capacity increases, but small changes in yaw cause substantial positional errors on edges
Solution Approach 1:
The patent applies local quality correction by independently adjusting the compensation parameters for different regions of the large substrate. The SLM system can apply position-specific corrections to edge areas that are more sensitive to yaw errors, while using different correction strategies for central regions.
Solution Approach 2:
The patent introduces an additional correction dimension by using angular/rotational compensation parameters in addition to linear position correction. This allows the system to compensate for yaw errors (rotational dimension) while writing on large substrates, effectively adding a rotational compensation degree of freedom to the positioning system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution minimizes pattern placement errors related to yaw, enabling precise and cost-effective creation of patterns on large substrates by accurately compensating for positional changes during the writing process.
Implementation Method 1
A multi-beam pattern generator may include a spatial light modulator (SLM) with independently controllable mirrors to reflect light onto a substrate to write a pattern
Data Source
AI summary
Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods are disclosed. A multi-beam pattern generator may include a spatial light modulator (SLM) with independently controllable mirrors to reflect light onto a substrate to write a pattern. The pattern may be written in writing cycles where the substrate is moved to writing cycle zone locations. The light is reflected by the SLM onto the substrate by mirrors of the SLM in active positions to write the pattern upon the substrate. By determining a location and yaw of the substrate with respect to the SLM in each writing cycle, some mirrors of the SLM may be digitally controlled to either inactive positions or the active positions to compensate for the yaw of the substrate. In this manner, the pattern written upon the substrate may be precisely written with compensation for yaw.