Multi-beam Writing Apparatus Collective Deflection Correction
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Solution Overview
Problem
In multi-beam writing techniques, positional deviations of charged particle beams on a substrate surface occur due to magnetic fields, Coulomb effects, and charging, making it difficult to accurately correct beam positions shot by shot.
Innovation Solution
A multi-charged particle beam writing apparatus and method that calculates a collective shift amount for all beams based on parameters related to previous or subsequent shots, allowing for collective deflection to correct positional deviations, thereby reducing beam shift amounts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multi-beam writing is used to increase writing throughput, then productivity is improved, but positional deviation of beams occurs due to magnetic fields and Coulomb effects
Solution Approach 1:
The patent calculates the shift amount for the k-th shot in advance based on parameters from (k+1)th and subsequent shots before actual writing. This preliminary calculation allows the system to pre-determine correction values that will compensate for positional deviations caused by magnetic fields and Coulomb effects during multi-beam writing, thereby maintaining beam position accuracy while preserving high writing throughput
Solution Approach 2:
The patent implements a feedback mechanism where shot data from (k+1)th and subsequent shots is used to calculate the shift amount for the k-th shot. This feedback approach allows the system to continuously adjust and correct beam positions based on actual writing conditions, compensating for dynamic positional deviations while maintaining high productivity in multi-beam writing operations
2Manufacturing precision
If blanking control is performed at high speed for each beam, then manufacturing precision is improved, but magnetic field interference from control circuits increases
Solution Approach 1:
The patent extracts and separates the positional deviation correction function from the individual beam control system. By calculating collective shift amounts based on shot data and applying corrections at the deflector level rather than through individual blanking control circuits, the system reduces magnetic field interference while maintaining dose control accuracy through the feedback mechanism
3Manufacturing precision
If average positional deviation is calculated and fed back for correction, then manufacturing precision is improved, but correction accuracy deteriorates because change amount varies for every shot
Solution Approach 1:
The patent transitions from static average correction to dynamic shot-specific correction. By calculating the shift amount for each k-th shot based on actual parameters from (k+1)th and subsequent shots, the system adapts to varying positional deviation conditions for every shot, maintaining high measurement precision while improving manufacturing precision through dynamic feedback
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces positional deviations of multiple charged particle beams by using shot data from past or future shots to adjust beam positions, improving writing accuracy and throughput in multi-beam writing processes.
Implementation Method 1
a writing mechanism including a deflector for deflecting the multiple charged particle beams, and the writing mechanism configured to perform the k-th shot onto the substrate with the multiple charged particle beams while shifting the all of the multiple charged particle beams of the k-th shot by collective deflection according to the shift amount
Implementation Method 2
since wiring of electrodes configuring each blanker and control circuits are close to each beam, a magnetic field generated by the current flowing in these wiring and control circuits may affect the trajectory of beams
Implementation Method 3
As other factors affecting the trajectory of beams, there are a Coulomb effect, electrification, and the like
Data Source
AI summary
A multi-charged particle beam writing apparatus includes a movable stage to mount a substrate thereon, a shot data generation circuit to generate shot data of each shot of multiple charged particle beams, a shift amount calculation circuit to calculate a shift amount for collectively correcting positions of all of the multiple charged particle beams of the k-th shot, based on parameters related to at least the (k+1)th and subsequent shots (k being a natural number) of the multiple charged particle beams, and a writing mechanism including a deflector for deflecting the multiple charged particle beams, and to perform the k-th shot onto the substrate with the multiple charged particle beams while shifting the all of the multiple charged particle beams of the k-th shot by collective deflection according to the shift amount.