Multi-Beam Writing Apparatus Reducing Irradiation Time
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Solution Overview
Problem
In multi-beam writing processes for semiconductor devices, the modulation of irradiation amounts to correct beam position displacement leads to increased maximum irradiation time, thereby degrading writing throughput.
Innovation Solution
The method involves dividing the beam array into sub-beam arrays and assigning weights to each based on their irradiation time modulation rates, allowing for optimized irradiation across overlapping sub-stripe regions to reduce maximum irradiation time and improve throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the irradiation amount is modulated to correct beam position displacement, then the writing accuracy is improved, but the maximum irradiation time is increased and writing throughput is degraded
Solution Approach 1:
The beam array is divided into multiple sub-beam arrays, and the writing process is segmented into multiple writing processes. Each sub-beam array performs writing on different sub-stripe regions, allowing parallel processing and reducing the maximum irradiation time required for any single region.
Solution Approach 2:
The patent dynamically assigns weights to different sub-beam arrays based on their irradiation time modulation rates. This dynamic weight assignment optimizes the distribution of writing tasks across sub-beam arrays, balancing the load and reducing the maximum irradiation time while maintaining writing accuracy.
2Manufacturing precision
If the irradiation time is increased to correct beam position displacement, then the writing accuracy is improved, but the writing throughput is degraded
Solution Approach 1:
By segmenting the beam array into sub-beam arrays and dividing the writing task into multiple parallel writing processes, the patent reduces the maximum irradiation time required for any single writing process, thereby reducing the overall time loss while maintaining accuracy through weighted modulation.
Solution Approach 2:
The patent enables continuous useful action by having multiple sub-beam arrays write on different sub-stripe regions simultaneously. This parallel processing ensures that the writing operation continues across multiple regions without idle time, improving throughput while maintaining accuracy through coordinated weight assignment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the maximum irradiation time and enhances writing accuracy by evenly distributing irradiation across the beam array, thereby improving the overall writing throughput and maintaining constant stage speed during stripe writing.
Implementation Method 1
The blanking aperture array has electrode pairs for individually deflecting the beams, and an opening for beam passage is formed between each electrode pair. Blanking control on a passing electron beam is performed by controlling the electrode pair (blanker) at the same potential or at different potentials.
Implementation Method 2
an electron beam discharged from an electron gun passes through a shaping aperture array having multiple openings, and forms a multi-beam (multiple electron beams)
Data Source
AI summary
In one embodiment, a multi-beam writing method includes forming a beam array of a multi-beam, assigning sub-beam arrays to each of a plurality of sub-stripe regions, the sub-stripe regions being obtained by dividing a region on the substrate, and the sub-beam arrays being obtained by dividing the beam array, calculating an irradiation time modulation rate being used for each beam belonging to each of the sub-beam arrays, calculating a weight for each of the sub-beam arrays based on the irradiation time modulation rate for each of the beams belonging to a group of the sub-beam arrays, and assigning the calculated weight to the sub-beam array, and performing multiple writing on each of the sub-stripe regions by performing writing on each of the sub-stripe regions with the sub-beam arrays, based on the weight assigned to the sub-beam array and the irradiation time modulation rate of the beam belonging to the sub-beam array.