Multi-Beam Writing Tracking for Stitching Accuracy and Throughput
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Solution Overview
Problem
Multi-beam writing apparatuses face challenges in achieving high stitching accuracy and throughput due to beam misalignment and distortion, which are exacerbated by dose modulation correction methods that reduce efficiency.
Innovation Solution
A multi-charged-particle-beam writing method that involves tracking multiple beams across a substrate with continuous movement, using a control unit to adjust deflection positions and apply beams in a specific order to compensate for positional errors, with the beams being applied in a first shot order followed by a second shot order to cancel out errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple beams are applied simultaneously to increase throughput, then productivity is improved, but beam misalignment and distortion increase leading to reduced manufacturing precision
Solution Approach 1:
The patent divides the writing process into multiple shots for each pixel, with different beam application orders in different shots. By segmenting the irradiation process and varying the shot order, the system compensates for beam shape distortion and misalignment while maintaining multi-beam parallel processing capability.
Solution Approach 2:
The patent performs preliminary determination of optimal shot orders based on beam shape characteristics before actual writing. The control unit pre-calculates and stores shot order information that compensates for expected beam distortion, allowing real-time correction without reducing throughput.
2Manufacturing precision
If dose modulation correction is applied to compensate for beam misalignment, then manufacturing precision is improved, but productivity decreases
Solution Approach 1:
The patent pre-determines optimal shot orders and beam application sequences before writing based on beam shape measurements. This preliminary preparation allows the system to compensate for misalignment through intelligent sequencing rather than time-consuming dose modulation corrections during actual writing.
Solution Approach 2:
The patent dynamically adjusts beam application order and timing based on real-time beam shape conditions. The control unit varies shot orders adaptively to compensate for beam distortion, replacing static dose modulation with dynamic temporal sequencing that maintains both precision and speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances writing accuracy and reduces positional errors by compensating for beam misalignment and distortion, thereby improving the overall efficiency and throughput of the writing process.
Implementation Method 1
a tracking operation is performed so that, when a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams, deflection positions of the multiple beams follow movement of the stage
Implementation Method 2
a multi-charged-particle-beam writing method includes performing a tracking operation such that, while a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams
Data Source
AI summary
In one embodiment, a multi-charged-particle-beam writing method includes performing a tracking operation such that, while a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams, deflection positions of the multiple beams follow movement of the stage, and applying the multiple beams to the substrate having a writing area including a plurality of rectangular regions arranged in a mesh during the tracking operation such that each of the plurality of rectangular regions is irradiated with the multiple beams. Each rectangular region includes a plurality of pixels each having a predetermined size and arranged in a mesh. At least one subset of the plurality of pixels is irradiated with the multiple beams in a first shot order and is then irradiated with the multiple beams in a second shot order different from the first shot order.