Multi Charged Particle Beam Writing Tracking Control
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Solution Overview
Problem
In multi-beam writing techniques for semiconductor devices, existing methods face challenges in reducing writing time and handling data transmission errors, which affect the precision and efficiency of pattern formation on increasingly narrow circuit lines.
Innovation Solution
A multi-charged particle beam writing method and apparatus that employs beam deflection control to track the movement of a stage, allowing for efficient writing by shifting and resetting beam positions, and includes a deflection control unit to manage beam deflection for tracking and irradiation, thereby addressing data transmission errors and optimizing writing time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple beams are used for multi-beam writing, then throughput is greatly increased, but writing time is extended due to tracking operation reset and swing back required for each shot
Solution Approach 1:
The patent applies preliminary action by continuously scanning beams in one direction using raster scan method before actual writing, maintaining tracking operation without reset. This prepares the beam positions in advance and eliminates the time-consuming swing back operation between shots, thereby reducing overall writing time while maintaining multi-beam throughput advantage
Solution Approach 2:
The patent implements continuity of useful action by making the tracking operation continuous across multiple shots without resetting. The beams continuously scan in one direction while maintaining their tracking function, eliminating interruptions and idle time between shots, thus reducing total writing time while preserving the high throughput benefit of multi-beam writing
2Manufacturing precision
If tracking operation is reset and swing back is performed for each shot, then beam positioning accuracy is maintained, but writing time increases
Solution Approach 1:
The patent applies dynamics by transitioning from a static reset-based tracking system to a dynamic continuous scanning system. The tracking operation adapts to continuous motion in one direction, allowing the system to maintain positioning accuracy through dynamic adjustment rather than periodic resetting, thereby eliminating time loss while preserving precision
Solution Approach 2:
The patent uses periodic action through raster scan method where beams continuously scan in one direction at regular intervals. This periodic scanning maintains tracking accuracy without requiring reset operations, as the systematic periodic motion naturally keeps beams positioned correctly throughout the writing process, reducing overall writing time
3Reliability
If data transmission errors occur during multi-beam writing, then writing precision is compromised, but the patent implements error handling mechanisms
Solution Approach 1:
The patent implements feedback by monitoring data transmission during multi-beam writing and using this information to adjust the writing process. When errors are detected, the system responds by adjusting beam irradiation or retransmitting data, ensuring writing precision is maintained despite potential transmission errors, while managing complexity through systematic feedback loops
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances writing efficiency by reducing writing time and ensuring precise pattern formation on semiconductor devices, even when data transmission errors occur, by effectively managing beam deflection and irradiation across the target surface.
Implementation Method 1
performing beam deflection such that the writing position of the each corresponding beam of the multi charged particle beams collectively follow a movement of a stage
Data Source
AI summary
A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.