Multi-Container Gas Supply System for Semiconductor Processing
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Solution Overview
Problem
In semiconductor manufacturing, the stable supply of processing gases is disrupted when switching between containers, leading to instability in gas delivery to the process chamber, which can cause defects in film formation during substrate processing.
Innovation Solution
A system with multiple precursor containers, flow rate controllers, and valves that automatically switch gas supply from one container to another when the remaining amount in one container falls below a threshold, ensuring continuous and stable gas delivery by regulating the opening state of control valves and using inert gases for purging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single container is used to supply processing gas, then the device structure is simple, but the gas supply is interrupted when the container is depleted
Solution Approach 1:
The system divides the gas supply function across multiple containers (first container and second container) connected through separate pipelines to a common mixing chamber. This segmentation allows independent operation of each container, ensuring that depletion of one container does not interrupt overall gas supply to the process chamber.
Solution Approach 2:
The patent merges the output streams from multiple containers at a common mixing chamber before delivering to the process chamber. The flow rate controllers from both container lines converge at the mixing chamber, combining their outputs to maintain continuous and stable gas supply even when individual containers are depleted.
2Reliability
If multiple containers are used to ensure continuous gas supply, then the gas supply reliability is improved, but the system complexity increases
Solution Approach 1:
The system incorporates flow rate controllers in each container's pipeline that automatically detect and respond to container depletion. When a container is depleted, its flow rate controller detects the change and automatically adjusts or closes its valve, triggering a switch to the other container without requiring external intervention, thus maintaining continuous operation.
Solution Approach 2:
The patent implements feedback mechanisms where the controller monitors the flow rates from both containers and the opening states of the valves. Based on this feedback, the controller automatically adjusts valve positions to maintain stable total flow to the process chamber, ensuring processing stability while managing the complexity of multiple containers.
3Reliability
If manual container switching is performed, then the device structure is simple, but the gas supply is interrupted during switching operations
Solution Approach 1:
The system uses automated flow rate controllers and valve mechanisms that self-regulate based on container status. When one container is depleted, the corresponding flow rate controller automatically closes its valve and the controller opens the valve for the other container, enabling automatic switching without manual intervention and without interrupting gas supply to the process chamber.
Solution Approach 2:
The controller continuously monitors the flow rates and valve states from both container lines. Based on this real-time feedback, the controller automatically determines when to switch between containers and executes the switching by adjusting valve positions, maintaining stable gas delivery throughout the transition without requiring manual operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration prevents interruptions in gas supply, allowing for continuous and stable precursor gas delivery, thereby maintaining consistent substrate processing and reducing the likelihood of defects in film formation.
Implementation Method 1
a flow rate controller configured to control a flow rate of the material supplied to a process space in which a processing target is placed by regulating an opening state of a control valve
Implementation Method 2
a plurality of open and close valves provided at the plurality of pipes respectively, and a controller configured to be capable of supplying the material to the process space via the flow rate controller from one container among the plurality of containers
Data Source
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AI summary
There is provided a technique that includes: containers (270A, 270B) accumulating a material, a flow rate controller (241a) controlling a flow rate of the material supplied to a process space (201) where a processing target (200) is placed by regulating an opening state of a control valve; pipes being in fluid communication between the flow rate controller (241a) and the containers (270A, 270B) respectively; open and close valves (243e, 243f) provided at the pipes respectively, and a controller (121) capable of supplying the material to the process space (201) via the flow rate controller (241a) from one container when the opening state of the control valve does not reach a preset threshold, and supplying the material to the process space (201) via the flow rate controller (241a) from two or more containers by opening the open and close valve provided between another container different from the one container and the flow rate controller (241a) when the opening state of the control valve reaches the preset threshold.