Multi-Emitter Illumination System for Lithography
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Solution Overview
Problem
Conventional lithography manufacturing systems face challenges in maintaining stable and consistent illumination intensity, leading to equipment downtime and high electrical energy consumption due to the limited lifetime of single illumination sources like mercury arc lamps and excimer lasers, which require frequent maintenance and replacement.
Innovation Solution
Implementing a multi-emitter illumination system using LEDs, diode lasers, or solid-state lasers, which can be monitored and controlled to maintain a predetermined optical output power, predict system lifetime, and compensate for failures, while minimizing downtime and optimizing maintenance cycles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a single illumination source (mercury arc lamp or excimer laser) is used, then the system can achieve sufficient optical intensity for lithography exposure, but the equipment lifetime is limited and requires frequent maintenance and replacement
Solution Approach 1:
The illumination system is divided into multiple independent illumination sources (e.g., multiple LEDs or laser diodes) instead of using a single source. Each source can be independently monitored and controlled, allowing the system to continue operating even if one source degrades or fails, thereby extending the effective equipment lifetime while maintaining required optical intensity levels.
2Device complexity
If a single illumination source is used, then the system structure is simple, but the system requires frequent maintenance and causes excessive equipment downtime
Solution Approach 1:
By segmenting the illumination system into multiple independent sources, the patent enables continued operation during maintenance of individual sources. The monitoring system detects degradation in real-time, allowing scheduled maintenance during non-critical periods rather than unexpected downtime, thus reducing total equipment downtime despite increased system complexity.
Solution Approach 2:
The system incorporates real-time monitoring of optical output from each illumination source. This feedback mechanism allows the control system to detect degradation trends and schedule maintenance proactively, preventing sudden failures and reducing unplanned downtime. The feedback also enables dynamic adjustment to maintain consistent illumination levels.
3Power
If a single high-power illumination source is used, then sufficient optical intensity can be achieved, but electrical energy consumption is excessive
Solution Approach 1:
The patent divides the high-power illumination requirement into multiple lower-power illumination sources (e.g., multiple LEDs or laser diodes). These segmented sources collectively provide the required optical intensity while consuming less electrical energy overall, as each individual source operates at lower power levels with higher conversion efficiency compared to a single high-power source.
Solution Approach 2:
The system changes the operational parameters of the illumination sources by using multiple low-power sources instead of one high-power source. This parameter change exploits the higher wall-plug efficiency of multiple low-power LED or laser diode sources, reducing total electrical energy consumption while maintaining the required optical output intensity for lithography exposure.
4Ease of operation
If conventional single-source illumination is used, then the system is easy to operate, but illumination intensity uniformity becomes unstable over time
Solution Approach 1:
By using multiple independent illumination sources, the patent creates a system where degradation of individual sources can be detected and compensated. The monitoring system tracks each source's output, and the control system adjusts individual source intensities to maintain uniform overall illumination, preserving stability without complicating operation.
Solution Approach 2:
The real-time monitoring of each illumination source's optical output provides feedback to the control system. This feedback enables automatic adjustment of individual source intensities to compensate for degradation, maintaining stable and uniform illumination across the exposure field over time without requiring manual intervention or complex operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The multi-emitter system achieves extended equipment lifespan, reduces electrical power consumption, and maintains consistent illumination intensity, enhancing manufacturing efficiency and reducing maintenance frequency.
Implementation Method 1
Implementing a multi-emitter illumination system using LEDs, diode lasers, or solid-state lasers
Implementation Method 2
Implementing a multi-emitter illumination system using LEDs, diode lasers, or solid-state lasers
Data Source
AI summary
An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.