Multi-Field Exposure Apparatus for Photolithography Throughput
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Solution Overview
Problem
Existing exposure apparatuses face inefficiencies in throughput due to the time required for changing masks and illumination conditions during multiple exposure processes in photolithography, leading to a drop in operation rate and productivity.
Innovation Solution
An exposure apparatus with an optical system that guides multiple exposure lights to irradiate multiple exposure fields on a substrate, allowing for simultaneous exposure of patterns from multiple masks with synchronized movement of masks and substrate, enhancing efficiency by reducing the need for frequent changes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple masks and illumination conditions are prepared for multiple exposure, then multiply exposure of substrate is achieved, but time is needed for changing masks and illumination conditions leading to drop in operation rate and throughput
Solution Approach 1:
The patent combines multiple exposure fields into a single optical system that can irradiate three or more exposure fields simultaneously with three or more exposure lights. This merging approach allows multiple patterns to be formed on different fields without requiring sequential mask changes, thereby maintaining multiply exposure capability while improving throughput by eliminating the time needed for changing masks and illumination conditions between exposures.
2Adaptability or versatility
If masks and illumination conditions are changed for each exposure, then different patterns are formed, but frequent changes cause drop in operation rate
Solution Approach 1:
The patent prepares multiple exposure lights with different illumination conditions in advance, guiding them to a single optical element that can direct them to different exposure fields. This preliminary preparation of multiple illumination paths allows the system to switch between different patterns and conditions without actual physical changes during operation, thereby maintaining adaptability while eliminating time loss associated with changing masks and illumination settings.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient multiple exposure of substrates, improving throughput and productivity by allowing continuous exposure with minimal interruption, thereby enhancing the manufacturing process.
Implementation Method 1
an optical system that has one optical element to which at least two of three or more exposure lights are guided, and that irradiates three or more exposure fields with the three or more exposure lights
Data Source
AI summary
An exposure apparatus provided with an optical system that has one optical element to which at least two of three or more exposure lights are guided, and that is capable of irradiating three or more exposure lights onto exposure fields that respectively correspond to the exposure lights, with the exposure apparatus multiply exposing a predetermined field on a substrate with images of a plurality of patterns that are formed based on the three or more exposure lights that are respectively irradiated onto the three or more exposure fields.