Multi-Heater Substrate Processing Apparatus for Heatup Time Reduction
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Solution Overview
Problem
Conventional vertical substrate processing apparatuses face challenges with prolonged heatup times due to heat escape through the furnace opening and adhesion of by-products to the inner surfaces, particularly at the low-temperature furnace opening.
Innovation Solution
The apparatus incorporates a multi-heater system with a first heater outside the processing chamber, a second heater near the substrate holder, a third heater near the furnace lid, and a purge gas system to efficiently heat and purge the chamber, reducing heat loss and by-product adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single heater installed outside the processing chamber is used, then the device complexity is reduced, but the heatup time is prolonged due to heat escape through the furnace opening
Solution Approach 1:
The heating system is divided into multiple independent heater units positioned at different locations: a first heater outside the processing chamber, a second heater near the substrate holder, and a third heater near the furnace lid. This segmentation allows targeted heating of different zones to compensate for heat escape through the furnace opening, thereby reducing overall heatup time without requiring a complete system redesign
Solution Approach 2:
The first heater installed outside the processing chamber performs preliminary heating of the chamber body before the substrate is fully heated. This preliminary action pre-warms the chamber structure, reducing the temperature gradient and minimizing heat loss through the furnace opening during the subsequent substrate heating phase, thus shortening the total heatup time
2Loss of energy
If the furnace opening is closed with a lid member, then heat escape is reduced, but by-products adhere to the inner surface of the low-temperature furnace opening
Solution Approach 1:
The temperature distribution in the furnace is made non-uniform with different zones serving different functions: the lower furnace region near the opening is maintained at lower temperature to prevent by-product adhesion, while the upper region near the substrate is maintained at high processing temperature. This local quality differentiation allows the furnace opening lid to close effectively without causing by-product accumulation
Solution Approach 2:
The heating system dynamically controls temperature at different locations independently through multiple heaters. The third heater near the furnace lid can adjust the temperature of the lid region separately from the substrate region, enabling the lid to be closed for heat retention while maintaining low temperature at the opening area to prevent by-product adhesion
3Productivity
If multiple heaters are installed at different locations, then heatup time is shortened and heating uniformity is improved, but the device complexity increases
Solution Approach 1:
Each heater unit is designed to serve multiple functions: the first heater provides preliminary chamber heating and reduces heat loss through the opening; the second heater directly heats the substrate holder and surrounding area; the third heater controls the furnace lid temperature. This multi-functionality allows three separate heaters to achieve comprehensive heating control that would otherwise require a more complex integrated heating system
Solution Approach 2:
The furnace opening lid acts as an intermediary thermal barrier between the high-temperature processing zone and the external environment. By positioning the third heater near the lid, the lid itself becomes a heat transfer medium that distributes thermal energy while blocking direct heat escape, thereby reducing the heating load on other components and simplifying the overall system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly shortens the heatup time and prevents by-product adhesion, ensuring efficient and uniform heating within the processing chamber.
Implementation Method 1
a first heater that is installed outside the process chamber and heats an inside of the process chamber
Implementation Method 2
a second heater that is installed near the substrate holder in the heat insulator and heats the inside of the process chamber
Implementation Method 3
a third heater that is installed near an end closer to the lid in the process chamber and heats the end
Implementation Method 4
a heat insulator that is installed below the substrate holder
Implementation Method 5
a purge gas supplier that supplies a purge gas into the heat insulator to purge around the second and third heaters
Data Source
AI summary
A substrate processing apparatus for preventing adhesion of by-products to an inner surface of a furnace opening is disclosed. An apparatus is provided with: a process chamber, a substrate holder, a process gas supplier that supplies a process gas into the process chamber, a first heater that is installed outside the process chamber and heats an inside of the process chamber, a heat insulator that is installed between a lid of the process chamber and the substrate holder, a second heater that is installed near the substrate holder in the heat insulator and heats the inside of the process chamber, a third heater that is installed near an end closer to the lid in the process chamber and heats the end, and a supplier that supplies a purge gas to purge around the second and third heaters into the heat insulator.