Multi-Metal Layer Patterning With Selective Etching and Anodization
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Solution Overview
Problem
Traditional display manufacturing processes are complex and costly, with many steps required to produce displays such as micro and mini light-emitting diode displays, and quantum dot light-emitting diode displays, which hinders efficiency and increases costs.
Innovation Solution
A method of manufacturing a structure with multi-metal layers involving the deposition of a top metal layer on a bottom metal layer, forming a patterned photoresist, etching the metal layers to create patterns, exposing a portion of the top metal pattern, and anodizing the exposed surface to form an anodized segment of the bottom metal layer, with an etch selectivity greater than 1.0.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If traditional display manufacturing processes are used, then manufacturing steps are complete and thorough, but the number of steps is large and efficiency is low
Solution Approach 1:
The patent combines multiple manufacturing operations into integrated process steps. Specifically, the method integrates photoresist patterning, etching of multiple metal layers, and anodization into a unified manufacturing sequence that reduces the total number of discrete steps while maintaining complete fabrication of the display structure
Solution Approach 2:
The patent segments the manufacturing process into distinct phases with different photoresist patterns applied at different stages. By dividing the process into initial photoresist formation, etching operations, photoresist removal, and anodization phases, the method achieves comprehensive manufacturing through organized sequential steps rather than numerous isolated operations
2Manufacturing precision
If multiple metal layers are fabricated with high precision, then structural integrity is maintained, but manufacturing complexity increases
Solution Approach 1:
The patent applies different photoresist patterns to different regions of the substrate at different stages. The first photoresist pattern defines initial metal layer regions, while the second photoresist pattern (formed after removing the first) defines additional metal layer regions. This localized, sequential patterning approach achieves precise multi-metal layer fabrication without requiring complex simultaneous patterning processes
Solution Approach 2:
The patent performs preliminary photoresist patterning and etching operations to establish the first metal layer structure before forming the second photoresist pattern. This preliminary action creates a foundation that guides subsequent fabrication steps, ensuring precise alignment and structural integrity of multiple metal layers while simplifying the overall process through staged preparation
3Adaptability or versatility
If advanced display types are produced, then product performance is enhanced, but manufacturing cost increases
Solution Approach 1:
The patent employs a universal manufacturing method that can produce different types of advanced displays (micro LED, mini LED, quantum dot LED) using the same multi-photoresist pattern and multi-etching process sequence. This universal approach allows a single fabrication methodology to accommodate multiple display technologies, reducing per-product development costs and enabling cost-effective production across diverse high-performance display types
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces the complexity and cost of display manufacturing by simplifying the process, enhancing efficiency, and allowing for the production of high-quality multi-metal layer structures, such as thin-film transistors, with improved performance.
Implementation Method 1
an etch selectivity of the top and bottom metal layers in the etching the top metal pattern is greater than 1.0
Implementation Method 2
anodizing the top surface portion to form an anodized segment of the bottom metal layer
Data Source
AI summary
A method of manufacturing a structure having multi metal layers includes: depositing a top metal layer on a bottom metal layer; forming a patterned photoresist on the top metal layer; etching the top and bottom metal layers through first hollow portions of the patterned photoresist to respectively form a top metal pattern and a bottom metal pattern; forming a second hollow portion in the patterned photoresist to expose a portion of the top metal pattern; etching the top metal pattern through the second hollow portion until a top surface portion of the bottom metal pattern is exposed by the etched top metal pattern, in which an etch selectivity of the top and bottom metal layers in the etching the top metal pattern is greater than 1.0; and anodizing the top surface portion to form an anodized segment of the bottom metal layer.