Multi-Optical Positioning for Precision Irradiation Processing
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Solution Overview
Problem
Existing processing systems face challenges in accurately measuring the position of objects and irradiation apparatuses during processing operations, particularly when using complex optical systems and multiple light sources.
Innovation Solution
A processing system is designed with an irradiation apparatus, a movement apparatus, and multiple measurement apparatuses to measure the position of objects and irradiation apparatuses using different light sources and optical systems, allowing for precise positioning and processing of workpieces through a combination of laser and imaging techniques.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple measurement apparatuses are used to measure both object position and irradiation apparatus position, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The measurement system is segmented into three distinct measurement apparatuses, each dedicated to measuring specific positions: first measurement apparatus for object position, second measurement apparatus for object position through optical system, and third measurement apparatus for irradiation apparatus position. This segmentation allows each apparatus to be optimized for its specific measurement task, improving overall measurement precision while maintaining manageable system complexity through functional specialization.
Solution Approach 2:
The measurement apparatuses are designed with multi-functionality to reduce overall system complexity. The first measurement apparatus can measure object position from different viewpoints, the second measurement apparatus measures object position through the irradiation optical system, and the third measurement apparatus measures both irradiation apparatus position and serves as a reference for coordinate transformation. This multi-functionality allows a single apparatus to perform multiple measurement tasks, reducing the need for additional dedicated devices.
2Manufacturing precision
If multiple measurement apparatuses with different optical systems are used, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
Different measurement apparatuses are assigned to measure different aspects of position with appropriate optical characteristics for each specific measurement need. The first measurement apparatus uses optical systems optimized for direct object measurement, the second measurement apparatus uses optical systems configured to measure through the irradiation optical system, and the third measurement apparatus uses optical systems optimized for irradiation apparatus positioning. This local optimization ensures each measurement function has the precise optical quality needed for its specific task.
Solution Approach 2:
The second measurement apparatus serves as an intermediary by measuring object position through the irradiation optical system itself. This intermediary measurement approach allows the system to account for optical system characteristics and transformations, improving the accuracy of position measurements without requiring direct modification of the irradiation system.
3Measurement precision
If three measurement apparatuses are deployed to measure positions in different directions, then measurement precision is improved, but loss of time increases due to multiple measurements
Solution Approach 1:
The three measurement apparatuses operate simultaneously and continuously to measure different position parameters. The first measurement apparatus continuously measures object position, the second measurement apparatus continuously measures object position through the optical system, and the third measurement apparatus continuously measures irradiation apparatus position. This continuous simultaneous operation eliminates sequential measurement delays and ensures all position data is available in real-time for coordinated control.
Solution Approach 2:
The measurement apparatuses are pre-configured with different optical axes and measurement directions before operation begins. The first measurement apparatus is positioned to measure object position from a reference viewpoint, the second measurement apparatus is configured to measure through the irradiation optical system, and the third measurement apparatus is positioned to measure irradiation apparatus position. This preliminary configuration ensures that all measurement functions are ready to operate simultaneously without requiring sequential setup or adjustment during processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves high-resolution processing and measurement capabilities, enabling the formation of complex surface structures and precise markings on workpieces, while improving processing efficiency and accuracy.
Implementation Method 1
a third measurement apparatus that measures a position of the irradiation apparatus by emitting, from a position which is away from the irradiation apparatus, a measurement light toward the irradiation apparatus and detecting the measurement light
Implementation Method 2
a processing apparatus that process the object by irradiating a surface of the object with processing light
Data Source
AI summary
A processing system, which processes an object by irradiating the object with a processing light through an irradiation optical system, includes: an irradiation apparatus including at least a terminal optical element of the irradiation optical system; a movement apparatus that moves the irradiation apparatus; a first measurement apparatus that is disposed at the irradiation apparatus and measures a position of the object; a second measurement apparatus that measures the position of the object through at least the terminal optical element; and a third measurement apparatus that emits, from a position which is away from the irradiation apparatus, a measurement light toward the irradiation apparatus and measures the position of the irradiation apparatus by detecting the measurement light.