Multi-Phase Precursor Delivery for Single-Chamber Semiconductor Processing
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Solution Overview
Problem
Conventional semiconductor processing systems require multiple chamber transfers due to the use of different phases of precursors, leading to reduced throughput and undesired thermal cycling.
Innovation Solution
Incorporation of remote precursor delivery systems that can generate vapor from non-gaseous precursors, allowing delivery of precursors in any phase to a single chamber, eliminating the need for substrate transfers and enabling simultaneous or sequential processing operations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple chambers are used for different precursor phases, then processing versatility is improved, but substrate transfer requirements increase and throughput decreases
Solution Approach 1:
The patent combines multiple precursor delivery systems (gas-phase, liquid-phase, and solid-phase) into a single processing chamber. The chamber can receive and process all three phases of precursors simultaneously or sequentially without requiring substrate transfer to different chambers, thereby resolving the contradiction between versatility and throughput.
Solution Approach 2:
The processing chamber is designed with universal capability to handle all phases of precursors (gas, liquid, solid) through a unified delivery system. This multi-functional chamber eliminates the need for specialized chambers for each precursor phase, improving both versatility and productivity simultaneously.
2Adaptability or versatility
If multiple chamber transfers are performed, then different precursor phases can be processed, but processing time increases and throughput decreases
Solution Approach 1:
The system prepares all precursor delivery mechanisms (vaporization systems for liquid and solid precursors, gas delivery systems) in advance within the single chamber environment. This preliminary preparation eliminates the need for time-consuming chamber transfers during the processing sequence, allowing immediate transition between different precursor phases.
Solution Approach 2:
The unified precursor delivery system enables continuous processing without interruption for chamber transfers. The chamber can seamlessly transition between gas-phase, liquid-phase, and solid-phase precursors maintaining continuous useful action, thereby reducing total processing time while preserving versatility.
3Adaptability or versatility
If substrates are transferred between chambers, then different precursor phases are accommodated, but thermal cycling occurs and device quality may deteriorate
Solution Approach 1:
By merging all precursor delivery systems into a single chamber, the patent eliminates the physical movement of substrates between chambers. This prevents the thermal cycling that occurs during chamber transfers, where substrates are exposed to temperature changes and potential contamination, thereby protecting device quality while maintaining the ability to process all precursor phases.
4Productivity
If remote precursor delivery systems are implemented, then single-chamber multi-phase processing is enabled, but system complexity increases
Solution Approach 1:
The patent introduces remote precursor delivery systems as intermediary components that bridge the gap between different precursor phases and the processing chamber. These remote systems (including vaporization chambers and delivery lines) act as mediators that convert liquid and solid precursors into vapor form for unified delivery, enabling single-chamber multi-phase processing while managing complexity through modular intermediary components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances processing efficiency by allowing multiple processing operations in a single chamber, increasing throughput and reducing complexity by eliminating substrate transfers and thermal cycling.
Implementation Method 1
The precursor source may be operable to generate a vapor from the non-gaseous precursor
Implementation Method 2
The remote precursor delivery source may include a flow controller that is operable to control a flow of the vapor to the gas panel
Data Source
AI summary
Exemplary semiconductor processing systems may include at least one processing chamber. Each of the at least one processing chamber may include a gas distribution assembly. The systems may include a gas panel that is fluidly coupled with each gas distribution assembly. The systems may include a remote precursor delivery system that is fluidly coupled with the gas panel. The remote precursor delivery system may include a precursor source associated with a non-gaseous precursor. The precursor source may be operable to generate a vapor from the non-gaseous precursor. The remote precursor delivery system may include a flow controller that is operable to control a flow of the vapor to the gas panel.