Multi-pitch Block Copolymers for Directed Self-Assembly
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Solution Overview
Problem
Current block copolymers used in directed self-assembly for lithographic patterning face challenges such as high thermal energy requirements, long annealing times, and defects in self-assembly processes, particularly for large domain spacing and multi-pitch applications, which limit their industrial viability.
Innovation Solution
Development of kinetically enhanced ABA triblock copolymers with mono- and multi-tethered structures and low glass transition temperature modifications, allowing for faster and defect-free self-assembly processes by optimizing tether placement and composition to improve mobility and thermal energy absorption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If conventional block copolymers are used for directed self-assembly, then self-assembly can occur, but high thermal energy requirements and long annealing times are needed
Solution Approach 1:
The patent modifies the chemical composition and molecular weight of block copolymer segments to change the annealing temperature and time parameters. By adjusting the glass transition temperatures of blocks A and B, and optimizing the molecular weight ratio, the self-assembly process occurs at lower temperatures and shorter times while maintaining pattern quality
Solution Approach 2:
The invention uses composite block copolymer structures (ABA triblocks, diblocks with different architectures) combining segments with specific properties. The composite structure allows optimization of both thermal energy requirements and annealing kinetics by selecting appropriate block compositions and ratios
2Reliability
If standard block copolymers are used, then self-assembly occurs, but defects are present in the assembled structures
Solution Approach 1:
The patent applies local quality by creating heterogeneous block copolymer structures where different segments have specific functions. The A blocks provide structural integrity while B blocks facilitate mobility and defect annihilation. This local differentiation allows rapid assembly while maintaining high reliability and defect-free structures
Solution Approach 2:
The invention introduces dynamic elements through mobile B blocks that can move and rearrange during self-assembly. This dynamic behavior enables defect correction and annealing processes to occur rapidly, achieving both high speed and defect-free assembly simultaneously
3Adaptability or versatility
If triblock copolymers are used for multi-pitch applications, then design flexibility improves, but molecular weight increases and kinetics slow down
Solution Approach 1:
The patent segments the triblock copolymer into distinct functional blocks with optimized molecular weights. By dividing the total molecular weight into smaller A and B blocks with specific ratios, the invention maintains design flexibility for multi-pitch applications while improving self-assembly kinetics through reduced segment size and enhanced mobility
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The novel triblock copolymers enable faster and more efficient self-assembly with reduced defects, facilitating the production of high-resolution patterns with improved yield and design flexibility for microelectronic devices.
Implementation Method 1
the self-assembly process of this block polymer layer occurs during annealing of this film overlying a neutral layer... the underlying, neutral layer, directs the nano-phase separation of the block copolymer domains
Implementation Method 2
Defect free assembly process of block copolymers requires high thermal energy and longer time... Development of kinetically enhanced ABA triblock copolymers... allowing for faster and defect-free self-assembly processes by optimizing tether placement and composition to improve mobility and thermal energy absorption
Data Source
AI summary
The present invention relates to two different block copolymer families having structures (1) or (6) which both have a polydispersity ranging from 1 to about 1.09. In structure (1), A is a polar block copolymer segment comprised of either alkyl 2-methylenealkanoate derived repeating units, lactone derived repeat units, oxirane derived repeat units, oxetane or cyclic carbonate derived repeat units; L is either a direct valence bond or a linking moiety derived from a 1, 1-diarylethene; B segment is a non-polarblock copolymer segment comprised of styrenic repeat unit, E are end groups selected; and wherein said block copolymer is multi-tethered with oligo flexible tethered groups at various positions as outlined. In structure (6), Ai is a polar block copolymer segment which has Tg of about 50° C. and to about 100° C.; comprised of alkyl 2-methylenealkanoate derived repeating units, lactone derived repeat units, oxirane derived repeat units, oxetane or cyclic carbonate derived repeat units; Bi is a styrenic block copolymer segment, which has a Tg from about 50° C. and to about 100° C., B2 is a block copolymer segment with a Tg ranging from about −5° C. to about −50° C., The present invention also pertains to compositions comprising either the block copolymer having structures (1) or the block copolymer having structure (6) and to methods of using these compositions. E-A-L-B-L-A-E (1) E1-A1-L1-B2-B1—B2-L1-A1-E1(6)