Multi-Positional Valve Gas Injection System for Precise Flow Control
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Solution Overview
Problem
Existing gas injection systems for beam processing systems lack precise control over gas flow rates and require time to establish correct flow, leading to exposure of samples to incorrect gas flows and residual gas contamination, especially when handling multiple gases.
Innovation Solution
A multiple gas injection system (MGIS) that allows for independent adjustment and purging of gas flow rates outside the sample vacuum chamber, using a valve configuration that diverts gases to an evacuation manifold during setup, ensuring accurate gas ratios and minimizing residual gas exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If gas flow rates are adjusted inside the sample vacuum chamber, then gas delivery can be controlled, but samples are exposed to incorrect gas flows and residual gas contamination during adjustment
Solution Approach 1:
The gas injection system is segmented into two distinct pathways: a setup pathway for adjusting gas flow rates and a delivery pathway for actual sample processing. The valve configuration separates these functions spatially, allowing independent control without cross-interference.
Solution Approach 2:
The gas flow adjustment function is extracted from the sample vacuum chamber environment and relocated to an external setup pathway. This extraction allows flow rate calibration to occur in isolation, preventing any potential contamination or incorrect gas exposure to samples during the adjustment process.
2Adaptability or versatility
If multiple gases are handled in traditional systems, then various processing requirements can be met, but gas flow stabilization takes too long and residual gas remains in the system
Solution Approach 1:
Gas flow rates are predetermined and pre-adjusted in the setup pathway before actual sample processing begins. The system performs preliminary gas flow calibration and stabilization outside the sample chamber, so that when gas delivery to samples commences, the correct flow rates are already established, eliminating delays.
Solution Approach 2:
The valve configuration enables dynamic switching between setup and delivery pathways. The system can rapidly transition between different gas flow states and configurations, allowing quick adaptation when switching between different gases while maintaining stable flow rates through the dedicated pathways.
3Measurement precision
If gas flow is adjusted in traditional systems, then flow rates can be controlled, but residual gas remains in conduits and requires purging procedures
Solution Approach 1:
The setup pathway acts as an intermediary between the gas source and the sample delivery system. This intermediate pathway allows for complete gas flow adjustment and stabilization before gas enters the sample vacuum chamber, eliminating the need for purging procedures and reducing precursor gas waste.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid and precise control over gas flow rates and mixtures, reducing contamination and processing time, with gas flow stabilization achieved in less than one second after needle insertion, improving the accuracy and efficiency of beam processing.
Implementation Method 1
A multiple gas injection system (MGIS) that allows for independent adjustment and purging of gas flow rates outside the sample vacuum chamber, using a valve configuration that diverts gases to an evacuation manifold during setup
Implementation Method 2
The crucible is heated to increase the vapor pressure of the source material, and the gas from the source material then flows to the sample
Implementation Method 3
The crucible is heated to increase the vapor pressure of the source material
Implementation Method 4
a gas from the source material then flows to the sample. The gas flow is regulated by the amount of heat supplied to the crucible
Data Source
AI summary
A multi-positional valve is used to control the destination of gas flows from multiple gas sources. In one valve position the gases flow to an isolated vacuum system where the flow rate and mixture can be adjusted prior to introduction into a sample vacuum chamber. In another valve position the pre-mixed gases flow from the isolated vacuum chamber and through a needle into the sample vacuum chamber.