Multi-Reactor RF Phase Synchronization for Stable Plasma Processing
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Solution Overview
Problem
Substrate processing apparatuses with multiple reactors face issues of RF frequency interference, leading to unstable plasma processes and non-uniformity due to power leakage and phase mismatch between reactors.
Innovation Solution
A substrate processing apparatus with a power generator that outputs phase-synchronized powers to multiple reactors through symmetrically arranged matching networks and power supply lines, using a signal generator, splitter, comparator, and amplifiers to ensure identical phases and minimize interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple reactors are equipped with separate RF power generators and matching networks, then each reactor can be independently controlled, but RF frequency interference occurs between reactors causing unstable plasma processes
Solution Approach 1:
The patent combines multiple RF power generators into a single shared power generator that supplies RF power to multiple reactors simultaneously. This merging eliminates RF frequency interference between reactors while maintaining independent plasma control through a phase controller that adjusts the phase of RF power supplied to each reactor individually.
Solution Approach 2:
The patent introduces a phase controller as an intermediary device between the shared RF power generator and the reactors. This phase controller mediates the RF power distribution by adjusting the phase of power supplied to each reactor, enabling independent control without requiring separate power generators for each reactor.
2Manufacturing precision
If separate power generators are used for each reactor, then individual substrate control is improved, but device complexity increases due to multiple matching networks and power generators
Solution Approach 1:
The patent merges multiple separate power generators and matching networks into a single shared RF power generator with a phase controller. This reduces device complexity by eliminating redundant components while maintaining the ability to precisely control individual substrates through phase adjustment.
Solution Approach 2:
The shared RF power generator is designed to serve multiple reactors simultaneously with universal functionality. The phase controller enables this single generator to provide independently controlled RF power to multiple reactors, making the system more versatile and less complex than having separate dedicated power generators for each reactor.
3Productivity
If RF power is supplied to multiple reactors simultaneously, then productivity increases, but signal interference occurs leading to non-uniform plasma generation
Solution Approach 1:
The phase controller acts as an intermediary that enables simultaneous RF power supply to multiple reactors while maintaining plasma uniformity. By independently adjusting the phase of RF power supplied to each reactor, the phase controller ensures uniform plasma generation across all reactors, allowing high productivity without sacrificing process quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution stabilizes the peak-to-peak voltage (Vpp) and prevents frequency interference, resulting in a stable and uniform plasma process across all reactors, enhancing process reproducibility and productivity.
Implementation Method 1
a power generator configured to supply first power to the first reactor and supply second power to the second reactor, wherein the power generator may be further configured to synchronize phases of the first power and the second power
Implementation Method 2
RF power generated by the RF power generator during substrate processing is supplied to a reaction space of each reactor through a matching network and an RF rod. The RF power supplied into the reaction space activates gas in the reaction space, and the substrate is processed by supplying the activated gas to the substrate.
Implementation Method 3
RF power generated by the RF power generator during substrate processing is supplied to a reaction space of each reactor through a matching network and an RF rod
Data Source
AI summary
A substrate processing apparatus capable of removing signal interference between reactors includes: a first reactor, a second reactor adjacent to the first reactor, and a power generator configured to supply first power to the first reactor and supply second power to the second reactor, wherein the power generator is further configured to synchronize phases of the first power and the second power.