Multi-Reflector UV Photoreactor for Uniform Fluid Irradiation
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Solution Overview
Problem
UV reactors experience variations in radiant power distribution and fluid velocity distribution, leading to uneven UV dose delivery and potential short-circuiting, which can result in inadequate treatment of fluids.
Innovation Solution
A fluid treatment apparatus with a reflector cone and reflective wall design that directs radiation in a longitudinal direction and controls fluid flow, using reflective surfaces and auxiliary reflectors to enhance uniformity of radiation and fluid velocity distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional UV reactors are used with standard radiation sources, then the reactor structure is simple, but the radiant power distribution is uneven and short-circuiting occurs
Solution Approach 1:
The reactor is divided into multiple flow channels separated by flow control elements, with each channel receiving controlled radiation from LED arrays. This segmentation allows independent optimization of radiation and flow distribution in each channel, improving overall uniformity while maintaining manageable complexity through modular design
Solution Approach 2:
Flow control elements act as intermediaries between the radiation source and fluid flow paths. These elements include flow distributors and baffle structures that mediate the interaction between radiation fields and fluid dynamics, ensuring uniform distribution without requiring complete redesign of the entire reactor system
2Adaptability or versatility
If UV-LEDs are used as radiation sources, then the radiation bandwidth is narrow and wavelength can be optimized, but the radiant power distribution varies considerably
Solution Approach 1:
Different LED arrays with specific wavelengths are positioned at different locations within the reactor to create locally optimized radiation fields. Flow control elements are also positioned to deliver specific flow rates to different regions, creating local quality variations that compensate for the narrow bandwidth of individual LEDs and achieve uniform overall distribution
Solution Approach 2:
The system transitions from considering only wavelength as the optimization dimension to adding spatial distribution as another dimension. By controlling both the spectral characteristics (wavelength) and spatial distribution (positioning and intensity) of multiple LED arrays, the system achieves uniform radiant power distribution while maintaining wavelength optimization capabilities
3Productivity
If fluid flows through the reactor chamber, then treatment is provided, but velocity distribution varies causing residence time distribution and short-circuiting
Solution Approach 1:
The fluid flow is segmented into multiple parallel channels by flow control elements, with each channel having controlled velocity and residence time. This segmentation prevents short-circuiting by ensuring all fluid portions traverse sufficient treatment zones, while maintaining high throughput through parallel flow paths
Solution Approach 2:
The flow control elements are designed to dynamically adapt fluid distribution based on flow rate conditions, using movable or adjustable components that optimize velocity distribution across channels. This dynamic control ensures uniform residence time and UV dose delivery while maintaining flexible throughput adjustment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves improved dose uniformity and reduces short-circuiting by optimizing radiation and fluid flow profiles, ensuring consistent UV treatment across the reactor.
Implementation Method 1
a reflector cone comprising a reflective surface that defines a reflector cone concavity... The reflective surface of the reflector cone is shaped to direct radiation from the radiation source into the main chamber
Implementation Method 2
a reflective wall located at a second, opposing longitudinal end of the main chamber... The reflective wall comprises a reflective surface facing the main chamber
Implementation Method 3
Light emitting diodes (LEDs) are semiconductor (solid state) radiation sources that release photons when an electric potential is applied across the LED
Data Source
AI summary
A UV reactor comprises a main chamber extending in a generally longitudinal direction. The main chamber may comprise a UV-LED and a reflective wall located at opposing longitudinal ends of the main chamber. Fluid enters main chamber through a fluid inlet and exits main chamber through a fluid outlet. The fluid inlet may be located at the reflective wall end of the main chamber. The fluid outlet may be located at the UV-LED end of the main chamber.