Systems and methods to clean a continuous substrate
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Solution Overview
Problem
Conventional systems for cleaning continuous substrates, such as those used in clean-room applications, face limitations in throughput and effectiveness in removing particulate matter, often resulting in substrates with high particulate counts and reduced cleanliness.
Innovation Solution
The implementation of a high-pressure, low-flow spray system combined with an agitator, such as a megasonic or ultrasonic transducer, and a drying mechanism to effectively remove particulates from continuous substrates, along with an agitation bath and rinsing sections to enhance cleanliness, while using reflector plates to direct energy and prevent re-deposition of particles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional cleaning systems are used, then the substrate can be cleaned, but the throughput is limited and particulate removal effectiveness is insufficient
Solution Approach 1:
The cleaning system is divided into multiple independent sections: pre-rinse section, main rinse section, agitation bath, and drying section. Each section performs a specific cleaning function with targeted spray nozzles and agitation mechanisms, allowing simultaneous processing of different substrate areas while maintaining high throughput and effective particulate removal.
Solution Approach 2:
An agitator with ultrasonic or megasonic transducer is implemented in the agitation bath to generate high-frequency vibrations that dislodge particulate matter from the substrate surface. This mechanical vibration mechanism significantly enhances particulate removal effectiveness while maintaining continuous substrate movement for high throughput.
2Manufacturing precision
If conventional cleaning methods are used, then cleaning is performed, but the substrate cleanliness level is insufficient for clean-room applications
Solution Approach 1:
The system replaces conventional mechanical contact cleaning with a multi-section spray rinse system that uses high-pressure liquid jets and ultrasonic agitation. This substitution achieves superior substrate cleanliness by effectively removing fine particulates without mechanical contact that could contaminate the substrate, while maintaining continuous high-speed processing.
Solution Approach 2:
The cleaning process utilizes controlled changes in liquid flow parameters including high-pressure spray patterns, flow rates, and agitation frequency. These parameter adjustments optimize both cleaning effectiveness for high substrate cleanliness and processing speed for maintained throughput.
3Manufacturing precision
If high flow spray is used to increase cleaning effectiveness, then particulate removal improves, but cleaning fluid consumption increases
Solution Approach 1:
Each cleaning section (pre-rinse, main rinse, agitation) is equipped with specifically positioned spray nozzles that target particular contamination areas on the substrate. This localized cleaning approach concentrates cleaning fluid where needed most, maximizing particulate removal effectiveness while minimizing overall fluid consumption compared to uniform high-flow spraying.
Solution Approach 2:
The system applies cleaning fluid at moderate flow rates in multiple sequential sections rather than excessive flow in a single section. The cumulative effect of progressive cleaning across sections achieves superior particulate removal while keeping total fluid consumption lower than conventional high-flow single-stage systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly increases the throughput and cleanliness of the substrates, achieving low particulate counts and improved cleanliness standards, suitable for clean-room applications by efficiently removing particulates and ions from the substrates.
Implementation Method 1
applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate
Implementation Method 2
an agitator, including at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate
Implementation Method 3
using reflector plates to direct energy and prevent re-deposition of particles
Implementation Method 4
drying the continuous substrate
Data Source
AI summary
An example system to clean a continuous substrate includes: one or more high pressure nozzles configured to spray a high pressure, low flow spray of a first cleaning fluid at the continuous substrate to remove particulate matter from the continuous substrate; an agitation bath and a plurality of rollers configured to transport the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having the agitation bath; an agitator in the agitation bath, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and a vacuum roller configured to vacuum moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; a dryer configured to dry the continuous substrate.