Multi-Source Deposition Module for Uniform Substrate Coating
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Solution Overview
Problem
Existing substrate deposition processes are inefficient and do not allow for the simultaneous deposition of multiple materials on an entire substrate, leading to non-uniform deposition layers and reduced product lifespan.
Innovation Solution
A substrate deposition apparatus and method that utilizes a deposition source module with multiple deposition sources arranged in a horizontal direction, allowing for simultaneous deposition of different materials on a substrate by moving the module in a horizontal direction, ensuring uniform deposition across the entire substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single deposition source is used for substrate deposition, then the device structure is simple, but the deposition process cannot deposit multiple materials simultaneously and cannot cover the entire substrate uniformly
Solution Approach 1:
The deposition source module is segmented into multiple independent deposition sources (first deposition source, second deposition source, third deposition source, fourth deposition source) arranged in a horizontal direction. Each deposition source can deposit different materials simultaneously, enabling multi-material deposition across the entire substrate without requiring multiple separate deposition chambers or sequential processing steps.
Solution Approach 2:
The deposition sources are arranged horizontally across the substrate width rather than vertically above a single point. This horizontal arrangement allows simultaneous deposition across different regions of the substrate, transforming a point-by-point deposition process into a area-wide parallel deposition process, thereby covering the entire substrate uniformly in one operation.
2Manufacturing precision
If multiple deposition sources are arranged horizontally to deposit multiple materials simultaneously, then the deposition uniformity and productivity improve, but the device structure and source module complexity increase
Solution Approach 1:
Each deposition source in the horizontal array is positioned to target specific regions of the substrate, with the fourth deposition source positioned to deposit material on the opposite side of the substrate from the first deposition source. This localized deposition approach ensures uniform coverage across different areas of the substrate while maintaining a relatively simple overall module structure that can be manufactured as an integrated unit.
3Area of stationary object
If deposition sources are arranged to cover the entire substrate, then the deposition coverage improves, but the spacing and alignment precision requirements increase
Solution Approach 1:
Multiple deposition sources are merged into a single integrated deposition source module that moves together as one unit. This combining approach ensures that all deposition sources maintain fixed relative positions and spacing, simplifying the alignment requirements compared to having independently positioned sources. The module can be manufactured with precise internal spacing, reducing the need for complex external alignment mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of uniform deposition layers on the entire substrate, improving product lifespan and efficiency by allowing for the deposition of multiple materials simultaneously, thereby enhancing the durability of the deposition layer.
Implementation Method 1
heating the deposition source module
Implementation Method 2
performing a deposition process on the substrate includes heating the deposition source module
Data Source
AI summary
A substrate deposition method includes placing a substrate in a substate deposition apparatus and performing a deposition process on the substrate in the substate deposition apparatus. The substrate deposition apparatus includes a process chamber having a process space, a stage in the process chamber, and a deposition source module. The deposition source module includes a plurality of first deposition sources arranged in a first direction that is a horizontal direction, a plurality of second deposition sources arranged in the first direction, a plurality of third deposition sources arranged in the first direction, and a plurality of fourth deposition sources arranged in the first direction. The performing of the deposition process on the substrate includes heating the deposition source module and moving the deposition source module in a direction parallel to a second direction that is a vertical direction intersecting the first direction.


