Multi-Stage Pumping Liner for Uniform Chamber Exhaust Flow
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Solution Overview
Problem
Existing semiconductor processing chamber systems face challenges in achieving uniform gas flow patterns during exhaust, leading to residual particle buildup and non-uniform material formation on substrates.
Innovation Solution
The introduction of a semiconductor processing chamber pumping liner with an annular housing and a plenum divider, which separates the plenum into two chambers and includes a plurality of apertures to facilitate even gas flow distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single plenum chamber is used in the pumping liner, then the structure is simple, but the gas flow pattern is non-uniform causing residual particle buildup and non-uniform material formation on substrates
Solution Approach 1:
The single plenum chamber is divided into multiple plenum chambers (first, second, third, and fourth plenum chambers) separated by partition walls. Each plenum chamber has its own set of apertures, allowing independent control of gas flow in different regions. This segmentation enables uniform gas distribution across the substrate surface while maintaining a manageable structural complexity through modular design.
2Productivity
If exhaust gases are removed quickly from the chamber, then productivity is improved, but residual particles fall on patterned substrates causing contamination
Solution Approach 1:
Different regions of the pumping liner are designed with different aperture distributions across multiple plenum chambers. Each plenum chamber can be optimized for local exhaust requirements, creating tailored flow patterns that efficiently remove gases while minimizing particle generation and deposition on substrates.
Data Source
AI summary
Exemplary semiconductor processing systems may include a pumping system, a chamber body that defines a processing region, and a pumping liner disposed within the processing region. The pumping liner may define an annular member characterized by a wall that defines an exhaust aperture coupled to the pumping system. The annular member may be characterized by an inner wall that defines a plurality of apertures distributed circumferentially along the inner wall. A plenum may be defined in the annular member between interior surfaces of the walls. A divider may be disposed within the plenum, where the divider separates the plenum into a first plenum chamber and a second plenum chamber, wherein the first plenum chamber is fluidly accessible from the apertures defined through the inner wall, and wherein the divider defines at least one aperture providing fluid access between the first plenum chamber and the second plenum chamber.