Multi-Story Substrate Treatment Lines for Parallel Process Execution

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Solution Overview

Problem

Conventional substrate treating apparatuses face difficulties in efficiently changing substrate treatment processes for each substrate, leading to challenges in performing multiple processes in parallel.

Innovation Solution

A substrate treating apparatus with multiple substrate treatment lines and a controller that allows for the change of treatment processes for each substrate treatment line, enabling parallel execution of different treatment processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a single main transport mechanism is used in each treating block, then the apparatus structure is simplified, but the ability to perform multiple different treatment processes in parallel is limited

Engineering Contradiction:
Improvetransport mechanism structureVSAvoidprocess change capability
Core Design Contradiction:
Device complexityVSAdaptability or versatility

Solution Approach 1:

The apparatus is divided into multiple treating blocks (first treating block, second treating block, etc.), each with its own independent main transport mechanism. This segmentation allows each block to operate independently with different treatment processes, resolving the contradiction by enabling process versatility while keeping each individual block's structure simple.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Each treating block is designed as a universal module that can perform different treatment processes (resist film forming, developing, heat treatment, etc.). The main transport mechanisms in different blocks can be assigned different processes, allowing the same structural design to serve multiple functions across the apparatus.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Device complexity

If substrates are transported through a single treatment line, then the transport path is simple, but the throughput and parallel processing capability are reduced

Engineering Contradiction:
Improvetransport path configurationVSAvoidsubstrate throughput
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The apparatus introduces multiple treatment lines (first treatment line, second treatment line, etc.) that operate in parallel, adding a dimensional aspect to substrate processing. Instead of a single sequential path, substrates can be processed through multiple concurrent paths, significantly increasing throughput while maintaining relatively simple individual transport paths.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Multiple treating blocks and treatment lines are merged into a single integrated apparatus with a unified control system. This allows parallel processing of substrates through different treatment lines while maintaining coordinated operation, achieving high throughput without requiring completely separate independent systems.

Inventive Principle:
Principle #5Merging (Combining)

3Device complexity

If the same treatment process is applied to all substrates, then the control system is simplified, but the flexibility to handle different process requirements is lost

Engineering Contradiction:
Improvecontrol systemVSAvoidprocess customization
Core Design Contradiction:
Device complexityVSAdaptability or versatility

Solution Approach 1:

The control system is segmented to independently control each treating block and main transport mechanism. This allows different treatment processes to be assigned to different blocks without requiring complex coordination, simplifying the overall control architecture while enabling process customization across multiple parallel lines.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20250140584A1Substrate treating apparatus with parallel first and second parts of substrate treatment lines on multiple stories for simultaneously treating a plurality of substrates
Publication Date: 2025.05.01 SCREEN SEMICON SOLUTIONS CO LTD
  • US20250140584A1 patent drawing
  • US20250140584A1 patent drawing
  • US20250140584A1 patent drawing

AI summary

A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.