Multi-tip Test Apparatus for High Aspect Ratio Semiconductor Inspection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor process monitoring technologies face challenges in accurately inspecting structures with high aspect ratios, as they often rely on single tips that struggle with both precise profiling and efficient milling across large areas, leading to limitations in structural information acquisition and measurement speed.
Innovation Solution
A test apparatus and method utilizing a plurality of tips with different shapes and rigidity levels, allowing for selective profiling and milling operations, where the optimal tip is chosen based on the specific task and conditions, enabling precise structural inspection and measurement of semiconductor devices with high aspect ratios.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single tip is used for both profiling and milling, then device complexity is reduced, but measurement precision and productivity deteriorate due to inability to perform both functions effectively
Solution Approach 1:
The patent divides the inspection system into multiple tips, each specialized for specific functions (profiling, milling, or both). This segmentation allows each tip to be optimized for its designated task, improving measurement precision while maintaining manageable system complexity through modular design.
Solution Approach 2:
The patent employs tips with multi-functionality, where certain tips can perform both profiling and milling operations. This universal design reduces the total number of tips needed while maintaining high precision for both functions, effectively balancing device complexity and measurement precision.
2Device complexity
If a single tip performs both profiling and milling, then device complexity is reduced, but productivity deteriorates due to limitations in handling large area inspections
Solution Approach 1:
By segmenting inspection tasks across multiple specialized tips, the system can perform profiling and milling simultaneously or in optimized sequences, significantly improving productivity for large area inspections while keeping each tip's function simple and manageable.
Solution Approach 2:
The patent implements dynamic tip selection and switching mechanisms that adapt to inspection requirements. This dynamic approach allows the system to optimize measurement speed by selecting appropriate tips based on the specific task and sample characteristics, enhancing overall productivity.
3Ease of operation
If conventional monitoring devices are used, then ease of operation is maintained, but measurement precision deteriorates for structures with high aspect ratios
Solution Approach 1:
The patent replaces conventional mechanical monitoring devices with an advanced tip-based system that combines atomic force microscopy and controlled milling. This substitution maintains ease of operation through automated control while dramatically improving measurement precision for high aspect ratio structures through specialized tip geometries and force control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid and accurate structural inspection and measurement of semiconductor devices by alternating between profiling and milling with optimally selected tips, improving the acquisition of structural information and reducing measurement time.
Implementation Method 1
detecting a curvature of a cantilever caused by force between a tip and the sample
Implementation Method 2
a depth of the sample being processed by the milling in the first direction is controlled based on a relationship between a distance between the tip and the sample and force between the tip and the sample
Data Source
AI summary
A test apparatus includes a movable stage to support a sample, tips above the stage that have different shapes and alternately perform profiling and milling on the sample, a tip stage connected to a cantilever coupled to the tips, the tip stage to adjust a position of the cantilever, a position sensor to obtain information about a positional relationship between the tips and the sample, a stage controller to control movements of the stage and the tip stage, based on the information about the positional relationship, and a tip controller to select the tips for performing the profiling or milling and to determine conditions for performing milling, wherein a depth of the sample being processed by the milling in the first direction is controlled based on a relationship between a distance between the tips and the sample and a force between the tips and the sample.


